This thesis investigates the effects of low temperatures on Silicon Germanium (SiGe) Hterojunction Bipolar Transistors (HBT) BiCMOS technology. A comprehensive set of dc measurements were taken on first, second, third and fourth generation IBM SiGe technology over a range of temperatures (room temperature to 43K for first generation, and room temperature to 15K for the rest). This work is unique in the sense that this sort of comprehensive study of dc characteristics on four SiGe HBT technology generations over a wide range of temperatures has never been done before to the best of the authors knowledge.M.S.Committee Member: Dr. John D. Cressler; Committee Member: Dr. John Papapolymerou; Committee Member: Dr. Joy Laska
This work investigates the fundamental device limits related to operational voltage constraints and ...
The objective of this work is to develop a generalizable understanding of the degradation mechanisms...
This work examines the effects of radiation and strain on silicon-germanium (SiGe) heterojunction bi...
This thesis presents a comprehensive assessment of breakdown and operational voltage constraints in ...
Transistor mismatch is a crucial design issue in high precision analog circuits, and is investigated...
The objective of the dissertation is to combine the recent Mixed-Mode reliability stress studies int...
Using bandgap engineering, silicon-germanium (SiGe) BiCMOS technology effectively combines III-V tra...
The objective of the proposed work is to study the behavior of SiGe HBTs at cryogenic temperatures a...
This thesis describes the characterization and modeling of various hot carrier degradation mechanism...
The objective of this research is to investigate the effect that low temperature has on the radiatio...
As Si-manufacturing compatible SiGe HBTs are making rapid in-roads into RF through mm-wave circuit a...
Silicon germanium heterojunction bipolar transistors (SiGe HBTs) have recently gained attention due ...
The silicon germanium heterojunction bipolar transistor, SiGe HBT, has very high frequency response ...
The objective of this work is to investigate the suitability of applying silicon-germanium (SiGe) he...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
This work investigates the fundamental device limits related to operational voltage constraints and ...
The objective of this work is to develop a generalizable understanding of the degradation mechanisms...
This work examines the effects of radiation and strain on silicon-germanium (SiGe) heterojunction bi...
This thesis presents a comprehensive assessment of breakdown and operational voltage constraints in ...
Transistor mismatch is a crucial design issue in high precision analog circuits, and is investigated...
The objective of the dissertation is to combine the recent Mixed-Mode reliability stress studies int...
Using bandgap engineering, silicon-germanium (SiGe) BiCMOS technology effectively combines III-V tra...
The objective of the proposed work is to study the behavior of SiGe HBTs at cryogenic temperatures a...
This thesis describes the characterization and modeling of various hot carrier degradation mechanism...
The objective of this research is to investigate the effect that low temperature has on the radiatio...
As Si-manufacturing compatible SiGe HBTs are making rapid in-roads into RF through mm-wave circuit a...
Silicon germanium heterojunction bipolar transistors (SiGe HBTs) have recently gained attention due ...
The silicon germanium heterojunction bipolar transistor, SiGe HBT, has very high frequency response ...
The objective of this work is to investigate the suitability of applying silicon-germanium (SiGe) he...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
This work investigates the fundamental device limits related to operational voltage constraints and ...
The objective of this work is to develop a generalizable understanding of the degradation mechanisms...
This work examines the effects of radiation and strain on silicon-germanium (SiGe) heterojunction bi...