Material, optical and electrical characterization of DC sputtered CuO by tuning oxygen concentration

To fabricate large area photodetection material with high sensitivity, low cost and easy processing for biomedical imaging and environmental applications, P type CuO layers with proper bandgap, high optical absorption and good electrical performance have been fabricated by DC reactive magnetron sputtering Considering that Copper oxide has three different phases CuO Cu 4 O 3 and Cu 2 O), it features the advantage of multiple bandgaps by tuning the oxygen concentration By XRD, Raman and SEM measurements, the phases of sputtered layers can be determined For the calculation of Bandgap and Urbach energy, UV VIS IR spectrophotometer has been used to measure the reflectance and transmittance of thin films Hall measurements have also been carried out to measure the carrier type, mobility, concentration and sheet resistance