p. 2532-2535The electrical resistivity was investigated from room temperature down to 1.7 K for the shallow acceptor carbon in GaAs prepared by ion implantation with impurity concentrations between 1017 and 1019 cm23. Good agreement was obtained between the measured resistivities and resistivities calculated by a generalized Drude approach at similar temperatures and doping concentrations. The critical impurity concentration for the metal–nonmetal transition was found to be about 1018 cm23
Recently we have reproducibly grown vapor-phase epitaxial GaAs, with less than 10% compensation, in ...
Ion implantation is an alternative technique to the epitaxial growth of semiconductor material for d...
We have used a piston-cylinder apparatus to measure the resistivity of GaAs plates as a function of ...
The electrical resistivity was investigated from room temperature down to 1.7 K for the shallow acce...
Four samples of GaAs:Mg (p-type) with ion-implanted doses of 5 x 1012 , 1 X 1013, 3 X 1013 and 1 x 1...
Two samples, GaAs:Mg (p-type) and GaAs:Si (n-type), ion-implanted to the same dose of 5 x 1012 ions/...
Two samples, GaAs:Mg (p-type), ion-implanted with different doses of 3X1013 cm-2 and lX1013 cm-2 , w...
Carbon was implanted into GaAs at the energy of 1 MeV with doses between 131013 and 2 31015 cm22 at ...
Cadmium ions were implanted in GaAs crystals at 135 keV to doses ranging from 1012 to 1016 ion/cm2 a...
The room‐temperature electrical properties of 28 semi‐insulating GaAs crystals have been determined ...
[[abstract]]The characteristics of an amorphous GaAs film by implanting dense arsenic ions into semi...
The temperature dependence of electrical resistivity was measured for three ma-terials: a conductor ...
A theoretical expression for the low temperature resistivity of germanium semiconductor as a functio...
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by ...
This thesis describes an experimental study of conducting layers formed in gallium arsenide (GaAs) s...
Recently we have reproducibly grown vapor-phase epitaxial GaAs, with less than 10% compensation, in ...
Ion implantation is an alternative technique to the epitaxial growth of semiconductor material for d...
We have used a piston-cylinder apparatus to measure the resistivity of GaAs plates as a function of ...
The electrical resistivity was investigated from room temperature down to 1.7 K for the shallow acce...
Four samples of GaAs:Mg (p-type) with ion-implanted doses of 5 x 1012 , 1 X 1013, 3 X 1013 and 1 x 1...
Two samples, GaAs:Mg (p-type) and GaAs:Si (n-type), ion-implanted to the same dose of 5 x 1012 ions/...
Two samples, GaAs:Mg (p-type), ion-implanted with different doses of 3X1013 cm-2 and lX1013 cm-2 , w...
Carbon was implanted into GaAs at the energy of 1 MeV with doses between 131013 and 2 31015 cm22 at ...
Cadmium ions were implanted in GaAs crystals at 135 keV to doses ranging from 1012 to 1016 ion/cm2 a...
The room‐temperature electrical properties of 28 semi‐insulating GaAs crystals have been determined ...
[[abstract]]The characteristics of an amorphous GaAs film by implanting dense arsenic ions into semi...
The temperature dependence of electrical resistivity was measured for three ma-terials: a conductor ...
A theoretical expression for the low temperature resistivity of germanium semiconductor as a functio...
In this work we present studies for the behavior of impurity breakdown of two GaAs samples grown by ...
This thesis describes an experimental study of conducting layers formed in gallium arsenide (GaAs) s...
Recently we have reproducibly grown vapor-phase epitaxial GaAs, with less than 10% compensation, in ...
Ion implantation is an alternative technique to the epitaxial growth of semiconductor material for d...
We have used a piston-cylinder apparatus to measure the resistivity of GaAs plates as a function of ...