Ion beam modification of materials for optics, electronic and spintronics -ion implantation using accelerators or laser induced plasma ion generation

Ion beam modification offers a broad field of the creating the new functional materials and nano-structures for optics, electronics, spintronics and other material branches. Using ions produced by ion accelerators or implanters\nmeans the usage of the monoenergetic beams for precise doped layer, nano-particles or cluster creation by varying the ion implantation specie versus matrix combination together with the implantation energy, ion flux etc. Recently\nappears the multienergetic ion implantation which is realized by using of the intense laser shot generating plasma from the specially designed targets, where the ions are accelerated and can be then implanted into the various\nmaterials. This contribution will present an overview and comparison of different ion beam modification techniques, plasma ion implantation will be also mentioned