Add to ORKGThe delivered thesis deals with the theory of very thin layers deposition by means of pulse magnetron sputtering and the proposal, realization and testing of the power supply source for the pulse magnetron sputtering
The high power pulsed magnetron sputtering (HPPMS) approach to thin film deposition has significant ...
The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the ...
In this paper specific advantages and disadvantages of different pulse magnetron sputtering processe...
Abstract: A pulsed-dc power supply has been designed and constructed for use in a magnetron sputteri...
WO2004094686 A UPAB: 20041122 NOVELTY - Device for pulse magnetron sputtering comprises a recipient ...
The presented thesis deals with the design and assembly of the generator for pulse magnetron sputter...
Pulse generators in magnetron sputter systems have to generate an electromagnetic field between the ...
DE 10143145 C UPAB: 20021120 NOVELTY - Production of a layer system on a substrate (2) in a vacuum d...
The major objective of this project is to develop a high voltage pulsed power supply (PPS) modules t...
In this paper specific advantages and disadvantages of different pulse magnetron sputtering processe...
This bachelor’s thesis is focused on description of magnetron sputtering device NP 12 for the thin m...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
Magnetron sputtering nowadays is the most important technology for the deposition of high-quality th...
Recently, FEP developed a new family of flange mounted magnetron sources together with pulsed poweri...
The application of high power pulses with peak voltage of −2 kV and peak power density of 3 kW cm−2 ...
The high power pulsed magnetron sputtering (HPPMS) approach to thin film deposition has significant ...
The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the ...
In this paper specific advantages and disadvantages of different pulse magnetron sputtering processe...
Abstract: A pulsed-dc power supply has been designed and constructed for use in a magnetron sputteri...
WO2004094686 A UPAB: 20041122 NOVELTY - Device for pulse magnetron sputtering comprises a recipient ...
The presented thesis deals with the design and assembly of the generator for pulse magnetron sputter...
Pulse generators in magnetron sputter systems have to generate an electromagnetic field between the ...
DE 10143145 C UPAB: 20021120 NOVELTY - Production of a layer system on a substrate (2) in a vacuum d...
The major objective of this project is to develop a high voltage pulsed power supply (PPS) modules t...
In this paper specific advantages and disadvantages of different pulse magnetron sputtering processe...
This bachelor’s thesis is focused on description of magnetron sputtering device NP 12 for the thin m...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
Magnetron sputtering nowadays is the most important technology for the deposition of high-quality th...
Recently, FEP developed a new family of flange mounted magnetron sources together with pulsed poweri...
The application of high power pulses with peak voltage of −2 kV and peak power density of 3 kW cm−2 ...
The high power pulsed magnetron sputtering (HPPMS) approach to thin film deposition has significant ...
The magnetron sputter source is used in HV and UHV coating systems and is primarily employed in the ...
In this paper specific advantages and disadvantages of different pulse magnetron sputtering processe...