Plasmachemical deposition and characterization of hexamethyldiloxane thin layers

Thin films have been used to modify surface properties of various materials for many years. Plasma Enhanced Chemical Vapor Deposition (PECVD) is one of the possible methods for their preparation and this technique is applied in this work as well. An organosilicone – hexamethyldisiloxane – is used as precursor. Thin films are created on the surface of the substrate using mixture of precursor and oxygen in radiofrequently excited capacitively coupled plasma. The aim of the thesis is to find the optimal deposition conditions for production of transparent thin layers with good barrier capabilities, low oxygen transmission rate especially. Thin film depositions were realized for different compositions of the deposition mixture in continuous and pulsed mode of plasma with varying supplied power and duty cycle values. The deposition process itself was monitored in situ by optical emission spectroscopy. Thin film coatings were analyzed to determine their physical chemical properties (infrared spectroscopy, surface energy) and barrier properties. Using optical emission spectroscopy, important particles were identified in the deposition plasma. Vibrational, rotational and electron temperatures were determined from relative intensities of chosen fragments. Composition of thin films was studied by infrared spectroscopy. The best results of oxygen transmission rate were achieved with layers prepared from deposition mixture with high oxygen content. It was possible to improve barrier properties by performing deposition in pulsed plasma mode with 20–30% duty cycle. In this diploma thesis, optimal deposition conditions of thin films from hexamethyldisiloxane with low oxygen transmission rate were determined. It is possible to use these results in practical applications, such as corrosion inhibitors for archaeological objects. Optionally, they can be used in various industry branches where it is desirable and feasible to prevent oxygen access to the material by deposition of barrier coatings