Study of organosilicone fragmentation in plasma

This Bachelor Thesis deals on the study of organosilicone monomers in plasma. The dimethylphenylsilane (DMPS) was chosen as the organosilicone example. The theoretical part gives basic overview of plasmachemical processes and technologies used in present world. Some part is reserved for the description of plasma diagnostic basic methods as optical emission spectroscopy and mass spectroscopy. The experimental part is constituted from two different experiments. The first one was done as model experiment of DMPS fragmentation by electron beam of exact energy and it was completed at Faculty of Mathematics, Physics and Informatics in Bratislava. Results of these experiments brought a set of electron energies needed for the creation of various ionic fragments from the original molecule as well as the cross sections for their creation. The second part of the experiments was carried out under the inductively coupled RF low pressure plasma conditions during the deposition of DMPS based thin films. The plasma was monitored by optical emission spectroscopy at different discharge power. Various species were identified in the spectra. The calculation of plasma parameters and their comparision with the model experiment data will be subjects of the further work