In this valuable work, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to start with reactive magnetron sputtering, understand and investigate the technique, control their sputtering process and tune their existing process, obtaining the desired thin films.The most straightforwardmethod to change the surface properties of a ma- rial is to deposit a thin ?lm or coating on it. Hence, it is not surprising that an overwhelming amount of scienti?c and technical papers is published each year on this topic. Sputter deposition is one of the...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...
Since the introduction of the planar magnetron by J.S. Chapin in 1974 magnetron sputtering has becom...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...
Abstract. The magnetron sputtering processes allow the deposition of metals, alloys, ceramic, and po...
Magnetron sputtering is a very versatile plasma deposition method invented in the 1930ies by Penning...
The planar magnetron cathode was introduced in 1974. Magnetron sputtering has become the most import...
Sputter deposition is an important technology, which is widely used in the production of thin films ...
The complexity of the reactive magnetron sputtering process is demonstrated by four simulation examp...
The complexity of the reactive magnetron sputtering process is demonstrated by four simulation examp...
Reactive magnetron sputtering is a widely used technique for deposition of various compound thin fil...
Abstrad: Recent developments in the techniques used to produce surface layers of oxides and nitrides...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
Advanced coatings play an important role in a wide range of industrial applications. These coatings ...
The magnetron sputtering process has become established as the process of choice for the deposition ...
Thin films of Al2O3 and AlN have been fabricated by reactive sputtering using magnetron sputtering e...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...
Since the introduction of the planar magnetron by J.S. Chapin in 1974 magnetron sputtering has becom...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...
Abstract. The magnetron sputtering processes allow the deposition of metals, alloys, ceramic, and po...
Magnetron sputtering is a very versatile plasma deposition method invented in the 1930ies by Penning...
The planar magnetron cathode was introduced in 1974. Magnetron sputtering has become the most import...
Sputter deposition is an important technology, which is widely used in the production of thin films ...
The complexity of the reactive magnetron sputtering process is demonstrated by four simulation examp...
The complexity of the reactive magnetron sputtering process is demonstrated by four simulation examp...
Reactive magnetron sputtering is a widely used technique for deposition of various compound thin fil...
Abstrad: Recent developments in the techniques used to produce surface layers of oxides and nitrides...
Thin-film deposition by sputtering is a process belonging to the family of physical vapor deposition...
Advanced coatings play an important role in a wide range of industrial applications. These coatings ...
The magnetron sputtering process has become established as the process of choice for the deposition ...
Thin films of Al2O3 and AlN have been fabricated by reactive sputtering using magnetron sputtering e...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...
Since the introduction of the planar magnetron by J.S. Chapin in 1974 magnetron sputtering has becom...
In plasma-based deposition processing, the importance of low-energy ion bombardment during thin film...