We measure charge transport in a hydrogenated amorphous silicon (a-Si:H) thin film using a nanometer scale silicon MOSFET as a charge sensor. This charge detection technique makes possible the measurement of extremely large resistances even in the presence of blocking contacts. At high temperatures, where the resistance of the a-Si:H is not too large, the charge detection measurement agrees with a direct measurement of current. The device geometry allows us to probe both the field effect and dispersive transport in the a-Si:H using charge sensing and to extract the density of states near the Fermi energy.United States. Army Research Office (contract W911NF-07-D-0004)United States. Dept. of Energy (award DE-FG02-08ER46515
ABSTRACT: Low Energy Plasma-Enhanced Chemical Vapor Deposition (LEPECVD) is one of the new technique...
Hydrogenated amorphous silicon and related materials have been applied to radiation detectors, utili...
Energy dissipation during chemical reactions at metal surfaces may excite electron-hole pairs in the...
It is shown that the large variations found in transport measurements in thin films of low density-o...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Physics, 2010.Cataloged from PDF ve...
Electrical transport properties of our PECVD a-Si:H material has been improved by using hydrogen and...
Abstract – The performance and limitations of a novel detector technology based on the deposition of...
Its high radiation resistivity and large-area capability are the expected advantages of this materia...
The performance and limitations of a novel detector technology based on the deposition of a thin-fil...
We calculated a more accurate density of states (DOS) profile from field‐effect (FE) measurements in...
Charge carrier transport in solid phase crystallized polycrystalline silicon poly Si was investiga...
Cataloged from PDF version of article.We report a scanning probe technique that can be used to measu...
The ability to deposit hydrogenated nanocrystalline silicon (nc-Si:H) on low-cost, flexible substrat...
It is shown that changes in the current-voltage characteristics of a structure composed of amorphous...
Current-voltage characteristics of Cr-doped hydrogenated amorphous silicon-V (Cr/p+a-Si:H/V) analogu...
ABSTRACT: Low Energy Plasma-Enhanced Chemical Vapor Deposition (LEPECVD) is one of the new technique...
Hydrogenated amorphous silicon and related materials have been applied to radiation detectors, utili...
Energy dissipation during chemical reactions at metal surfaces may excite electron-hole pairs in the...
It is shown that the large variations found in transport measurements in thin films of low density-o...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Physics, 2010.Cataloged from PDF ve...
Electrical transport properties of our PECVD a-Si:H material has been improved by using hydrogen and...
Abstract – The performance and limitations of a novel detector technology based on the deposition of...
Its high radiation resistivity and large-area capability are the expected advantages of this materia...
The performance and limitations of a novel detector technology based on the deposition of a thin-fil...
We calculated a more accurate density of states (DOS) profile from field‐effect (FE) measurements in...
Charge carrier transport in solid phase crystallized polycrystalline silicon poly Si was investiga...
Cataloged from PDF version of article.We report a scanning probe technique that can be used to measu...
The ability to deposit hydrogenated nanocrystalline silicon (nc-Si:H) on low-cost, flexible substrat...
It is shown that changes in the current-voltage characteristics of a structure composed of amorphous...
Current-voltage characteristics of Cr-doped hydrogenated amorphous silicon-V (Cr/p+a-Si:H/V) analogu...
ABSTRACT: Low Energy Plasma-Enhanced Chemical Vapor Deposition (LEPECVD) is one of the new technique...
Hydrogenated amorphous silicon and related materials have been applied to radiation detectors, utili...
Energy dissipation during chemical reactions at metal surfaces may excite electron-hole pairs in the...