Add to ORKGContains reports on six research projects.Joint Services Electronics Program Contract DAAL03-89-C-0001MIT Energy Laboratory - Synthetic Fuels CenterNational Science Foundation Grant CHE 85-08734Petroleum Research Fund Contract 19014-AC
The interaction between a molecule and a solid surface can lead to a great variety of elementary pro...
Plasma etching processes are widely used to produce patterns in the fabrication of microelectronic d...
The current trend in microelectronic processing is towards the reduction of device dimensions, thus ...
Contains reports on three research projects.Joint Services Electronics Program (Contract DAAL03-86-K...
Contains research objectives and summary of research on one research project.Joint Services Electron...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, February 2004.Vita.Inclu...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 2002.Also issued in leav...
Xenon difluoride is observed to react with Si–Si σ-dimer and σ-lattice bonds of Si(100)2×1 at 150 K ...
Journal ArticleThe title reaction is studied using guided ion beam mass spectrometry. Absolute react...
As part of a project with SEMATECH, detailed chemical reaction mechanisms have been developed that d...
AbstractMolecular dynamics simulations were performed to investigate SiF2 continuously bombarding th...
This research program examined the heterogeneous reaction kinetics and reaction dynamics of surface ...
Molecular dynamics (MD) simulations for silicon and silicon dioxide etching by energetic halogens (F...
Molecular dynamics simulations of the reactions between gaseous fluorine atoms and (SiFx)n adsorbate...
The dynamics of electron-induced surface-reactions was studied a-molecule-at-a-time by scanning tunn...
The interaction between a molecule and a solid surface can lead to a great variety of elementary pro...
Plasma etching processes are widely used to produce patterns in the fabrication of microelectronic d...
The current trend in microelectronic processing is towards the reduction of device dimensions, thus ...
Contains reports on three research projects.Joint Services Electronics Program (Contract DAAL03-86-K...
Contains research objectives and summary of research on one research project.Joint Services Electron...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, February 2004.Vita.Inclu...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemistry, 2002.Also issued in leav...
Xenon difluoride is observed to react with Si–Si σ-dimer and σ-lattice bonds of Si(100)2×1 at 150 K ...
Journal ArticleThe title reaction is studied using guided ion beam mass spectrometry. Absolute react...
As part of a project with SEMATECH, detailed chemical reaction mechanisms have been developed that d...
AbstractMolecular dynamics simulations were performed to investigate SiF2 continuously bombarding th...
This research program examined the heterogeneous reaction kinetics and reaction dynamics of surface ...
Molecular dynamics (MD) simulations for silicon and silicon dioxide etching by energetic halogens (F...
Molecular dynamics simulations of the reactions between gaseous fluorine atoms and (SiFx)n adsorbate...
The dynamics of electron-induced surface-reactions was studied a-molecule-at-a-time by scanning tunn...
The interaction between a molecule and a solid surface can lead to a great variety of elementary pro...
Plasma etching processes are widely used to produce patterns in the fabrication of microelectronic d...
The current trend in microelectronic processing is towards the reduction of device dimensions, thus ...