LER/LWR performance is currently considered as one of the major stumbling blocks complicating progress in the semiconductor technology. Line edge scans show that low frequency components clearly dominate the LER Power Spectral Density (PSD), thus implying a large characteristic length (>100-500 nm) phenomenon as the major LER source. Most of the theoretical analyses aimed to identify the origin of the LER were focused on the combined effect of exposure and CAR action statistics, and failed to explain the origin of this limit, which resulted in suggestions that there is more than just one phenomenon involved in LER generation. Depth profiling experiments were performed for a broad set of Polymer-PAG-Base combinations. Depth profiling PSD s...
Much work has already been done on how both the resist and line-edge roughness (LER) on the mask aff...
In this paper, using computationally intensive 3-D simulations in a grid computing environment, we p...
The impact of line-edge roughness (LER) on double-gate (DG) Schottky-barrier field-effect transistor...
Line edge roughness (LER) is a potential showstopper for the semiconductor industry. As the width of...
In this paper, line edge roughness (LER) analysis on top–down images acquired by means of a scanning...
Collective understanding of how both the resist and line-edge roughness (LER) on the mask affect the...
As gate linewidth control values approach the dimensions of resist polymer units, the accurate measu...
We study, in detail, statistical threshold voltage variability in a state of the art n-channel MOSFE...
In this paper, the correlation between line-edge-roughness (LER) and line-width-roughness (LWR) is s...
In this paper, we examine, in more detail, the strong correlation between the distribution of thresh...
Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern fo...
International audienceWe report a 20 nm half-pitch self-aligned double patterning (SADPP) process ba...
Line edge roughness (LER) and line width roughness (LWR) have raised questions and concerns as curre...
This dissertation presents a thorough investigation of how mask roughness induces speckle in the aer...
Parameter uctuations found in ultrasmall devices are generally associated with discrete random dopan...
Much work has already been done on how both the resist and line-edge roughness (LER) on the mask aff...
In this paper, using computationally intensive 3-D simulations in a grid computing environment, we p...
The impact of line-edge roughness (LER) on double-gate (DG) Schottky-barrier field-effect transistor...
Line edge roughness (LER) is a potential showstopper for the semiconductor industry. As the width of...
In this paper, line edge roughness (LER) analysis on top–down images acquired by means of a scanning...
Collective understanding of how both the resist and line-edge roughness (LER) on the mask affect the...
As gate linewidth control values approach the dimensions of resist polymer units, the accurate measu...
We study, in detail, statistical threshold voltage variability in a state of the art n-channel MOSFE...
In this paper, the correlation between line-edge-roughness (LER) and line-width-roughness (LWR) is s...
In this paper, we examine, in more detail, the strong correlation between the distribution of thresh...
Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern fo...
International audienceWe report a 20 nm half-pitch self-aligned double patterning (SADPP) process ba...
Line edge roughness (LER) and line width roughness (LWR) have raised questions and concerns as curre...
This dissertation presents a thorough investigation of how mask roughness induces speckle in the aer...
Parameter uctuations found in ultrasmall devices are generally associated with discrete random dopan...
Much work has already been done on how both the resist and line-edge roughness (LER) on the mask aff...
In this paper, using computationally intensive 3-D simulations in a grid computing environment, we p...
The impact of line-edge roughness (LER) on double-gate (DG) Schottky-barrier field-effect transistor...