The main purpose of this work consists on the preparation of single layered titanium oxycarbide, TiCxOy, thin films, deposited by d.c. reactive magnetron sputtering. The depositions were carried out from a TiC solid target, on (AISI M2) steel substrates at 200 oC, under the variation of two process parameters, such us time deposition and flow rate of reactive gas O2. The O2 flow varied between 0.5 and 7.5 sccm and the deposition time between 3600 and 6000 s. In terms of film colours, the most interesting colour tones have been observed if the oxygen flow increased. Static friction coefficient, wear and residual stresses are characterized and discussed as a function of both process parameters (oxygen flow and time). The results reveled a goo...
151 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1980.The tribology and micro-chemi...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribolog...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
The main purpose of this work consists in the preparation of titanium oxycarbide, TiCxOy, thin films...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
Recently, tribocorrosion is widely accepted as an interdisciplinary area of research and such studie...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
Magnetron sputtering is a flexible technique and allows producing a significant amount of types of c...
In this paper, thin TiCx films were coated by chemical vapour deposition method, and various duty cy...
185 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1981.Mechanical properties of surf...
TiCxOy films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribolog...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
151 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1980.The tribology and micro-chemi...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribolog...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
The main purpose of this work consists in the preparation of titanium oxycarbide, TiCxOy, thin films...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
Recently, tribocorrosion is widely accepted as an interdisciplinary area of research and such studie...
The main purpose of this work consists in the preparation of single layered titanium oxycarbide, TiC...
Magnetron sputtering is a flexible technique and allows producing a significant amount of types of c...
In this paper, thin TiCx films were coated by chemical vapour deposition method, and various duty cy...
185 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1981.Mechanical properties of surf...
TiCxOy films with various O/Ti ratios have been deposited by DC magnetron sputtering, using C pieces...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribolog...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...
151 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 1980.The tribology and micro-chemi...
Ti(C, O, N) thin films were prepared by magnetron sputtering and analysed in terms of their tribolog...
International audienceReactive magnetron sputtering was used to deposit titanium oxycarbide thin fil...