Add to ORKGThesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1992.Includes bibliographical references (leaves 113-115).by Yao-Ching Ku.Ph.D
Synchrotron X-ray lithography is a promising technique for high volume production of Ultra-LSI devic...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
X‐ray masks have been fabricated by depositing a compressively stressed refractory material on a waf...
Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Includes bibliographical references (p. 116-123).Supported in part by the Joint Services Electronics...
Tungsten film is one of promising materials for X-ray absorber in X-ray Lithography technology becau...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
In deep X-ray lithography (DXRL), synchrotron radiation (SR) is applied to transfer absorber pattern...
The work presented in this thesis covers a wide spectrum of topics concerned with the development of...
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Includes bibliographical references (p. 155-163).Research supported by Joint Services Electronics Pr...
Abstract : A process aimed at fabricating proximity x-ray lithography masks is presented. In this te...
Synchrotron X-ray lithography is a promising technique for high volume production of Ultra-LSI devic...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
X‐ray masks have been fabricated by depositing a compressively stressed refractory material on a waf...
Thesis (S.B. and M.Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and...
Thesis (M. Eng.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Compute...
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Includes bibliographical references (p. 116-123).Supported in part by the Joint Services Electronics...
Tungsten film is one of promising materials for X-ray absorber in X-ray Lithography technology becau...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer...
In deep X-ray lithography (DXRL), synchrotron radiation (SR) is applied to transfer absorber pattern...
The work presented in this thesis covers a wide spectrum of topics concerned with the development of...
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
Includes bibliographical references (p. 155-163).Research supported by Joint Services Electronics Pr...
Abstract : A process aimed at fabricating proximity x-ray lithography masks is presented. In this te...
Synchrotron X-ray lithography is a promising technique for high volume production of Ultra-LSI devic...
Thesis (S.M.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer S...
X‐ray masks have been fabricated by depositing a compressively stressed refractory material on a waf...