We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) for ohmic contacts to the silicon n+-n-structures whose n+-layer was formed using phosphorus diffusion or ion implantation
This work refers basically to the detailed understanding of the natural phenomena in real tunneling ...
The present work was undertaken in order to determine the effect of var i-ous thermal treatments up ...
The current transport mechanism usually assumed to be valid for metal silicon Schottky barriers is t...
We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) fo...
A new mechanism of contact resistance formation in ohmic contacts with high dislocation density is ...
The temperature dependence of contact resistivity rho(c) in lapped silicon specimens with donor conc...
About new mechanism of contact resistance formation in ohmic contacts to semiconductors with high d...
The file attached to this record is the author's final peer reviewed version. The Publisher's final ...
The current-voltage (I-V) characteristics of In/p-Si Schottky barrier contact were measured over the...
The effect of surface treatment on electrical characteristics of aluminum-silicon contacts has been ...
Improved means of electrical access to nanotechnology devices and accurate nanoscale characterizatio...
Improved means of electrical access to nanotechnology devices and accurate nanoscale characterizatio...
Metal to semiconductor contacts can be divided into two groups: rectifying contacts and non-rectifyi...
This work refers basically to the detailed understanding of the natural phenomena in real tunneling ...
Results of measurement of resistivity of mesoporous silicon formed on n-type substrates in a wide te...
This work refers basically to the detailed understanding of the natural phenomena in real tunneling ...
The present work was undertaken in order to determine the effect of var i-ous thermal treatments up ...
The current transport mechanism usually assumed to be valid for metal silicon Schottky barriers is t...
We present both theoretical and experimental temperature dependences of contact resistivity ρс(Т) fo...
A new mechanism of contact resistance formation in ohmic contacts with high dislocation density is ...
The temperature dependence of contact resistivity rho(c) in lapped silicon specimens with donor conc...
About new mechanism of contact resistance formation in ohmic contacts to semiconductors with high d...
The file attached to this record is the author's final peer reviewed version. The Publisher's final ...
The current-voltage (I-V) characteristics of In/p-Si Schottky barrier contact were measured over the...
The effect of surface treatment on electrical characteristics of aluminum-silicon contacts has been ...
Improved means of electrical access to nanotechnology devices and accurate nanoscale characterizatio...
Improved means of electrical access to nanotechnology devices and accurate nanoscale characterizatio...
Metal to semiconductor contacts can be divided into two groups: rectifying contacts and non-rectifyi...
This work refers basically to the detailed understanding of the natural phenomena in real tunneling ...
Results of measurement of resistivity of mesoporous silicon formed on n-type substrates in a wide te...
This work refers basically to the detailed understanding of the natural phenomena in real tunneling ...
The present work was undertaken in order to determine the effect of var i-ous thermal treatments up ...
The current transport mechanism usually assumed to be valid for metal silicon Schottky barriers is t...