Secondary Ion Mass Spectrometry (SIMS) for three dimensional analysis of materials is an exciting and rapidly developing technique. We describe a framestore datasystem for ion microprobe instruments and present images and three dimensional SIMS data acquired and processed with this system. The concept of retrospective depth profiling is introduced, particularly as a means to optimise concentration detection limits. We examine the dependence of concentration detection limits on spatial resolution
ABSTRACT: Imaging with cluster secondary ion mass spectrometry (SIMS) is reaching a mature level of ...
For quantitative depth profile analysis of hard and wear resistant coatings (general composition, me...
In principle mass spectral imaging has enormous potential for discovery applications in biology. The...
Secondary Ion Mass Spectrometry (SIMS) for three dimensional analysis of materials is an exciting an...
The determination of the three dimensional distributions of impurities and dopants at low concentrat...
The ability of five Secondary Ion Mass Spectrometry (SIMS) instruments to resolve thin layer and mod...
The performance of a new high resolution scanning ion microprobe (SIM) is elucidated with regard to ...
Depth profiling by sputtering in combination with the detection of mass selected secondary ions is a...
The use of sub-keV primary ion beams for SIMS depth profiling is growing rapidly, especially in the ...
As the dimensions of devices on integrated circuits are reduced, the importance of lateral spreading...
The depth resolution attainable in secondary ion mass spectroscopy (SIMS) depth profiling is shown t...
The limitations on secondary ion micro-analytical performance imposed by ionization probabilities, m...
Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA...
Atomic force microscopy (AFM) is a well-known tool for studying surface roughness and to collect dep...
AbstractThe quantitative analytical characteristics of a camera-based detection system for secondary...
ABSTRACT: Imaging with cluster secondary ion mass spectrometry (SIMS) is reaching a mature level of ...
For quantitative depth profile analysis of hard and wear resistant coatings (general composition, me...
In principle mass spectral imaging has enormous potential for discovery applications in biology. The...
Secondary Ion Mass Spectrometry (SIMS) for three dimensional analysis of materials is an exciting an...
The determination of the three dimensional distributions of impurities and dopants at low concentrat...
The ability of five Secondary Ion Mass Spectrometry (SIMS) instruments to resolve thin layer and mod...
The performance of a new high resolution scanning ion microprobe (SIM) is elucidated with regard to ...
Depth profiling by sputtering in combination with the detection of mass selected secondary ions is a...
The use of sub-keV primary ion beams for SIMS depth profiling is growing rapidly, especially in the ...
As the dimensions of devices on integrated circuits are reduced, the importance of lateral spreading...
The depth resolution attainable in secondary ion mass spectroscopy (SIMS) depth profiling is shown t...
The limitations on secondary ion micro-analytical performance imposed by ionization probabilities, m...
Extended abstract of a paper presented at Microscopy and Microanalysis 2012 in Phoenix, Arizona, USA...
Atomic force microscopy (AFM) is a well-known tool for studying surface roughness and to collect dep...
AbstractThe quantitative analytical characteristics of a camera-based detection system for secondary...
ABSTRACT: Imaging with cluster secondary ion mass spectrometry (SIMS) is reaching a mature level of ...
For quantitative depth profile analysis of hard and wear resistant coatings (general composition, me...
In principle mass spectral imaging has enormous potential for discovery applications in biology. The...