Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
- Versolato, Oscar
- Bayerle, Alex
- Bayraktar, Muharrem
- Behnke, Lars
- Bekker, H.
- Bouza, Zoi
- Colgan, James
- Crespo Lopez-Urrutia, J
- Deuzeman, M J
- Hoekstra, R.
- Kurilovich, Dmitry
- Poirier, L
- Liu, Bo
- Meijer, Randy
- Neukirch, Amanda
- Rai, S
- Ryabtsev, A
- Witte, S.
- Scheers, Joris
- Schupp, Ruben
- Sheil, J.
- Torretti, Francesco
- Ubachs, W.
DOIAbstract
Synopsis Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laserdriven plasma and present a surprising answer to the key question: what makes that light
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