Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a wide range of beam energies and currents. Three types of processes have been studied: sputter deposition, ion beam machining, and ion beam surface texturing. The broad range of source operating conditions allows optimum sputter deposition of various materials. An ion beam source was used to ion mill laser reflection holograms using photoresist patterns on silicon. Ion beam texturing was tried with many materials and has a multitude of potential applications
Ion beam processing of materials in general and semiconductors in particular, started with ion impla...
Results of experiments to study ion beam sputter polishing in conjunction with simultaneous depositi...
The general operation of a discharge chamber for the production of ions is described. A model is pre...
A microscopic surface texture is created by sputter etching a surface while simultaneously sputter d...
Ion propulsion research and development yields a mature technology that is transferable to a wide ra...
Plasma probe surveys were conducted in a 30-cm source to verify that the uniformity in the ion beam ...
Ion thruster engines for spacecraft propulsion can serve as ion beam sources for potential space pro...
The final figuring step in the fabrication of an optical component involves imparting a specified co...
Ion source systems in different configurations, have been used to generate unique morphologies for s...
Copper, silicon, aluminum, titanium and 316 stainless steel were textured by 1000 eV xenon ions from...
Ion beam sources for material processing in their working are no different from those required for s...
A 30 cm diameter argon ion source was evaluated. Ion source beam currents up to 4a were extracted wi...
A summary of the ion beam applications research (IBAR) program organized to enable the development o...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
It was found that ion beam texturing of silicon surfaces can be used to increase the effective surfa...
Ion beam processing of materials in general and semiconductors in particular, started with ion impla...
Results of experiments to study ion beam sputter polishing in conjunction with simultaneous depositi...
The general operation of a discharge chamber for the production of ions is described. A model is pre...
A microscopic surface texture is created by sputter etching a surface while simultaneously sputter d...
Ion propulsion research and development yields a mature technology that is transferable to a wide ra...
Plasma probe surveys were conducted in a 30-cm source to verify that the uniformity in the ion beam ...
Ion thruster engines for spacecraft propulsion can serve as ion beam sources for potential space pro...
The final figuring step in the fabrication of an optical component involves imparting a specified co...
Ion source systems in different configurations, have been used to generate unique morphologies for s...
Copper, silicon, aluminum, titanium and 316 stainless steel were textured by 1000 eV xenon ions from...
Ion beam sources for material processing in their working are no different from those required for s...
A 30 cm diameter argon ion source was evaluated. Ion source beam currents up to 4a were extracted wi...
A summary of the ion beam applications research (IBAR) program organized to enable the development o...
Sputtering and ion plating technologies are reviewed in terms of their potential and present uses in...
It was found that ion beam texturing of silicon surfaces can be used to increase the effective surfa...
Ion beam processing of materials in general and semiconductors in particular, started with ion impla...
Results of experiments to study ion beam sputter polishing in conjunction with simultaneous depositi...
The general operation of a discharge chamber for the production of ions is described. A model is pre...