Add to ORKGA semiconductor vacuum chemical vapor deposition facility (totally automatic) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to the track, and sent on to the next operation. The entire process was controlled by a computer
This paper describes the continuing design evolution of a new approach to spatially controllable che...
NASA Stennis Space Center's (SSC's) large rocket engine test facility requires the use of liquid pro...
For the fabrication of semiconductor devices, solar cells, and infrared detectors, thin film deposit...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
Improved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinde...
Chemical etching for automatic processing of integrated circuits is discussed. The wafer carrier and...
The parts of a chemical vapor deposition (CVD) reactor were examined extensively to create a procedu...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
Incorporating a state-of-the-art process control and instrumentation system into a complex system fo...
A chemical vapor deposition (CVD) reactor system with a vertical deposition chamber was used for the...
Mechanism using a helix sequentially feeds prescribed amounts of metal charges into an evaporation b...
A vapor deposition process has been defined through a spinoff effort of space welding development. I...
A wake shield facility providing an ultrahigh vacuum level for space processing is described. The fa...
In the semiconductor manufacturing industry, qualification of the tool is the most important thing t...
Typical examples of the use of the vacuum environments in industry include vacuum coating, vacuum dr...
This paper describes the continuing design evolution of a new approach to spatially controllable che...
NASA Stennis Space Center's (SSC's) large rocket engine test facility requires the use of liquid pro...
For the fabrication of semiconductor devices, solar cells, and infrared detectors, thin film deposit...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
Improved apparatus enables vacuum deposition of thick metal films on the inside surface of a cylinde...
Chemical etching for automatic processing of integrated circuits is discussed. The wafer carrier and...
The parts of a chemical vapor deposition (CVD) reactor were examined extensively to create a procedu...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
Incorporating a state-of-the-art process control and instrumentation system into a complex system fo...
A chemical vapor deposition (CVD) reactor system with a vertical deposition chamber was used for the...
Mechanism using a helix sequentially feeds prescribed amounts of metal charges into an evaporation b...
A vapor deposition process has been defined through a spinoff effort of space welding development. I...
A wake shield facility providing an ultrahigh vacuum level for space processing is described. The fa...
In the semiconductor manufacturing industry, qualification of the tool is the most important thing t...
Typical examples of the use of the vacuum environments in industry include vacuum coating, vacuum dr...
This paper describes the continuing design evolution of a new approach to spatially controllable che...
NASA Stennis Space Center's (SSC's) large rocket engine test facility requires the use of liquid pro...
For the fabrication of semiconductor devices, solar cells, and infrared detectors, thin film deposit...