Add to ORKGChemical etching for automatic processing of integrated circuits is discussed. The wafer carrier and loading from a receiving air track into automatic furnaces and unloading onto a sending air track are included
The research is reported for developing a system of computer programs to aid engineering in the desi...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
This thesis reports on characterization of etching process of aluminum thin film. It offers sequen...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
Interrelations between advanced processing techniques, integrated circuits, laser radiation, and mic...
A semiconductor vacuum chemical vapor deposition facility (totally automatic) was developed. Wafers ...
The operations analysis and equipment evaluations pertinent to the design of an automated production...
The aim of this study is the design of an automated etching system, Etching is a subtractive method ...
Etching resist as masking agent in photoengraving silicon semiconductor wafers and process specifica...
Chemical processes presented in this document include cleaning, pickling, surface finishes, chemical...
Dry processing - both etching and deposition - and present/future trends in semiconductor technology...
Oxide barrier isolated regions of silicon single crystals in silicon dioxide matrix by epitaxial dep...
The production dry etch processes are reviewed from the perspective of microelectronic fabrication a...
The general problem of using chemical etching when making printed circuit boards is that it usually ...
Method employing a pressure chamber is used for dicing semiconductor single-crystal wafers, containi...
The research is reported for developing a system of computer programs to aid engineering in the desi...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
This thesis reports on characterization of etching process of aluminum thin film. It offers sequen...
A semiconductor diffusion and oxidation facility (totally automated) was developed. Wafers arrived o...
Interrelations between advanced processing techniques, integrated circuits, laser radiation, and mic...
A semiconductor vacuum chemical vapor deposition facility (totally automatic) was developed. Wafers ...
The operations analysis and equipment evaluations pertinent to the design of an automated production...
The aim of this study is the design of an automated etching system, Etching is a subtractive method ...
Etching resist as masking agent in photoengraving silicon semiconductor wafers and process specifica...
Chemical processes presented in this document include cleaning, pickling, surface finishes, chemical...
Dry processing - both etching and deposition - and present/future trends in semiconductor technology...
Oxide barrier isolated regions of silicon single crystals in silicon dioxide matrix by epitaxial dep...
The production dry etch processes are reviewed from the perspective of microelectronic fabrication a...
The general problem of using chemical etching when making printed circuit boards is that it usually ...
Method employing a pressure chamber is used for dicing semiconductor single-crystal wafers, containi...
The research is reported for developing a system of computer programs to aid engineering in the desi...
A totally automated facility for semiconductor oxidation and diffusion was developed using a state-o...
This thesis reports on characterization of etching process of aluminum thin film. It offers sequen...