The contribution of the graded region of implanted p-n junctions is analyzed using an exponential profile. Though previously neglected, it was recently shown that this contribution to the saturation current of HgCdTe diodes is significant. Assuming a dominant Auger recombination, an analytical solution to the continuity equation is obtained. An expression for the current generation by the graded region is presented for both ohmic and reflecting boundary conditions. A revised condition for a wide region is derived. When the region is narrow, the current differs drastically from that of the zero-gradient case. The effects of the junction depth and the substrate and surface concentrations on the current are investigated. It is shown that the r...
In addition, the authors discuss the charge distribution conditions in the depleted region of a line...
This paper presents an analysis of junction leakage in heavily doped p+/n germanium junctions, targe...
Presents an enhanced analytical model to calculate junction depth and Hg interstitial profile during...
Minority carriers diffusion currents are particularly important in parasitic substrate couplings of ...
In this paper we consider influence of overgrowth of doped by diffusion and ion implantation areas o...
AbstractAn arbitrary junction and a symmetrical PIN semiconductor diode are used to obtain an equati...
It has been found that ion implantation doping results in the generation and diffusion of defect spe...
In the process of ion implantation, ion beams bombard the surface and create undesirable surface eff...
The lumped-model characterization for junction transistors has been extended to current ranges where...
The formation of shallow junctions in the source and drain regions is a major challenge to the conti...
The following experiment was completely in order to analyze and quantify the influence implantation ...
An abrupt p-n junction, such as occurs at the collector junction of an n-p-n transistor, is conside...
A theoretical analysis solves for the steady-state photocurrents produced by a given photo-generatio...
We consider a nonlinear model for analysis of current-voltage characteristic of a p-n-junction, whic...
Geometry-induced doping (G-doping) has been realized in semiconductors nanograting layers. G-doping-...
In addition, the authors discuss the charge distribution conditions in the depleted region of a line...
This paper presents an analysis of junction leakage in heavily doped p+/n germanium junctions, targe...
Presents an enhanced analytical model to calculate junction depth and Hg interstitial profile during...
Minority carriers diffusion currents are particularly important in parasitic substrate couplings of ...
In this paper we consider influence of overgrowth of doped by diffusion and ion implantation areas o...
AbstractAn arbitrary junction and a symmetrical PIN semiconductor diode are used to obtain an equati...
It has been found that ion implantation doping results in the generation and diffusion of defect spe...
In the process of ion implantation, ion beams bombard the surface and create undesirable surface eff...
The lumped-model characterization for junction transistors has been extended to current ranges where...
The formation of shallow junctions in the source and drain regions is a major challenge to the conti...
The following experiment was completely in order to analyze and quantify the influence implantation ...
An abrupt p-n junction, such as occurs at the collector junction of an n-p-n transistor, is conside...
A theoretical analysis solves for the steady-state photocurrents produced by a given photo-generatio...
We consider a nonlinear model for analysis of current-voltage characteristic of a p-n-junction, whic...
Geometry-induced doping (G-doping) has been realized in semiconductors nanograting layers. G-doping-...
In addition, the authors discuss the charge distribution conditions in the depleted region of a line...
This paper presents an analysis of junction leakage in heavily doped p+/n germanium junctions, targe...
Presents an enhanced analytical model to calculate junction depth and Hg interstitial profile during...