In this work the modeling, simulation, dynamic optimization and control of a Plasma Assisted Reactive Evaporation process (PARE) for the deposition of Zinc Oxide (ZnO) thin films are proposed. Initially, a dimensional unsteady-state model was developed for the process, this model apply dynamic material balances to the process and accounting for diffusive and convective mass transfer, and bulk and surface reactions in order to establish the space-time evolution of the concentration of the species (O_2(g) , O_((g))^., O_((g))^-, 〖Zn〗_((g)), 〖Zn〗_((g))^+ and 〖ZnO〗_((g))) present throughout the reactor and compute the final film thickness. The case of study corresponds to a pilot reactor operated by the Semiconductor Materials and Solar E...