Add to ORKGA technique for enhancing the performance of thin film electroluminescent devices is presented. Thin film phosphors have been processed with 20ns pulses of 880mJ/cm2 laser irradiation from a 249nm KrF excimer laser. Electroluminescent characterisation demonstrates a four-fold improvement in emitted luminous intensity, as compared to thermally annealed structures
Pulsed, combined voltage/UV excitation of commercial thin-film electroluminescent (TFEL) display pan...
none5noSingle layer thin-film materials such as aluminum, polyethylene, polypropylene, and their mul...
The recent progress in the field of thin film electroluminescence devices is reviewed. The mechanism...
This thesis presents results of a study of ZnS:Mn thin film phosphors used in Thin Film ELectrolumin...
Thin-films of europium doped yttrium oxide, (Y{sub 1{minus}x}Eu{sub x}){sub 2}O{sub 3}, were deposit...
Highly transparent thin film electroluminescent structures offering excellent switch on characterist...
In the later part of the twentieth century, classic cathode ray tubes (CRTs) are replaced by flat pa...
Pulsed KrF (248-nm) laser annealing was investigated as a post-deposition process for RF sputtered Z...
Alternating current thin film electroluminescent (ACTFEL) devices have been used in applications req...
Three high speed thin film patterning applications have been investigated using a high average power...
The subject of electroluminescence has currently acquired great importance because of its potential ...
AbstractLaser lift-off is an enabling technology for microelectronics growth markets such as light e...
This paper details an investigation into the deposition by RF magnetron sputtering of thin film phos...
Abstract: It is well known that BaMgAl10O17:Eu2+ (BAM) and CaMgSi2O6: Eu2+ (CMS) are a highly effici...
The three most important technologies for future display applications where electroluminescence (EL)...
Pulsed, combined voltage/UV excitation of commercial thin-film electroluminescent (TFEL) display pan...
none5noSingle layer thin-film materials such as aluminum, polyethylene, polypropylene, and their mul...
The recent progress in the field of thin film electroluminescence devices is reviewed. The mechanism...
This thesis presents results of a study of ZnS:Mn thin film phosphors used in Thin Film ELectrolumin...
Thin-films of europium doped yttrium oxide, (Y{sub 1{minus}x}Eu{sub x}){sub 2}O{sub 3}, were deposit...
Highly transparent thin film electroluminescent structures offering excellent switch on characterist...
In the later part of the twentieth century, classic cathode ray tubes (CRTs) are replaced by flat pa...
Pulsed KrF (248-nm) laser annealing was investigated as a post-deposition process for RF sputtered Z...
Alternating current thin film electroluminescent (ACTFEL) devices have been used in applications req...
Three high speed thin film patterning applications have been investigated using a high average power...
The subject of electroluminescence has currently acquired great importance because of its potential ...
AbstractLaser lift-off is an enabling technology for microelectronics growth markets such as light e...
This paper details an investigation into the deposition by RF magnetron sputtering of thin film phos...
Abstract: It is well known that BaMgAl10O17:Eu2+ (BAM) and CaMgSi2O6: Eu2+ (CMS) are a highly effici...
The three most important technologies for future display applications where electroluminescence (EL)...
Pulsed, combined voltage/UV excitation of commercial thin-film electroluminescent (TFEL) display pan...
none5noSingle layer thin-film materials such as aluminum, polyethylene, polypropylene, and their mul...
The recent progress in the field of thin film electroluminescence devices is reviewed. The mechanism...