Synthesis of organic layer-coated metal nanoparticles in a dual-plasma process

A novel dual-plasma process for the synthesis of organic layer-coated metal nanoparticles is presented. Metal nanoparticles are synthesized by the low-pressure pulsed arc evaporation of a metal cathode surface, followed by the in-flight deposition of a thin organic layer by capacitively-coupled radio-frequency (CCRF) plasma polymerization from a gaseous hydrocarbon monomer. The system is simple to operate and can be designed for high throughput. The combination of the synthesis and surface treatment of metal nanoparticles in the whole system avoids newly produced metal nanoparticles from being contaminated by surrounding environment.A home-made self-oscillatory pulsed power supply has been designed and built for the arc evaporation of metal sources. The stability of the pulsed arc system and the cathode erosion rate are discussed. The inductor present in the discharge loop is shown to have a stabilizing effect on the train of pulsed arcs. It was shown that the erosion rate was strongly dependent on peak arc currents due to the increased emission of macroparticles with peak arc currents, and the yield of metal nanoparticles was found to be slightly influenced by the peak arc current.The produced coated copper nanoparticles were characterized by field emission scanning electron microscopy (FE-SEM), transmission electron microscopy (TEM), Fourier-transform infrared spectroscopy (FT-IR), and X-ray photoelectron spectroscopy (XPS). It was revealed that the coated copper nanoparticles have a metal core of size ranging from a few to 50 nm, and that the thickness of the organic layer ranges from 3 to 10 nm. The smallest copper nanoparticles are crystalline, while the organic coating has a macromolecular structure and shows a hydrophobic behavior. The XPS results showed that the plasma polymer film is chemically adsorbed onto the surface of the copper nanoparticle.The effects of operating conditions such as reactor pressure and inert gas flow rate on the average size of the produced bare copper nanoparticles were studied. It was demonstrated that the metal nanoparticle size tends to decrease with decreasing reactor pressure, while inert gas flow rate has little influence on the mean nanoparticle size.The morphology of the plasma polymer coating was revealed to be strongly dependent on the RF plasma power, reactor pressure, and inert gas flow rate. Two kinds of organic films were produced: a smooth, uniform and dense polymer film and a liquid polymer film. Based on a series of experiments, a "characteristic map" for the in-flight plasma polymerization from the C2H 6 monomer generating an organic layer onto the Cu nanoparticles was developed. A simplified free-radical mechanism was proposed for the plasma polymerization from ethane.Other metal sources such as iron and aluminum were used as cathodes in the arc evaporation reactor. Transmission electron microscopy confirmed the production of coated nanoparticles similar in morphology to the ones obtained with the copper cathode. Lastly, ethylene glycol vapor were introduced as an alternative monomer into the plasma polymerization region. A non-uniform coating was observed on the metal nanoparticle surface