Non-evaporable getters (NEG) are widely used in ultra high vacuum (UHV) systems for particle accelerators to assure distributed pumping speed. By heating the NEG to an activation temperature, the oxide layer on the surface dissolves into the material, leaving a clean (activated) surface. The activated NEG surface is capable of chemisorbing most of the residual gases present in a UHV system and will act as a vacuum pump. NEG can be sputter deposited on the inner wall of vacuum chambers, turning the whole wall from a source of gas into a pump. At the largest particle accelerator in the world, the Large Hadron Collider, more than 6 km of beam pipe has been NEG coated. In this work, a DC magnetron sputtering system dedicated for coating cylindr...
On behalf of the TS-MME-CCS section Since 1997, Ti-Zr-V thin films have been studied to provide a so...
Non-Evaporable Getter (NEG) coating has been used for years in many particle accelerators due to its...
Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 degree...
Non-evaporable getters (NEG) are widely used in ultra high vacuum (UHV) systems for particle acceler...
Non-Evaporable Getter (NEG) coating has become an integral part of particle accelerator vacuum syste...
Non Evaporable Getter (NEG) films, sputter deposited onto the internal surfaces of vacuum chambers r...
AbstractAmong several methods used to obtain ultra-high vacuum (UHV) for particles accelerators cham...
First results concerning a new approach of TiZrV non-evaporable getter (NEG) thin films coating on v...
About 25 years ago, a study on the ultra-high vacuum behaviour of Non-Evaporable Getter (NEG) strips...
MAX IV is presently under construction at Lund, Sweden, and the first beam for the production of syn...
MAX IV is presently under construction at Lund, Sweden, and the first beam for the production of syn...
AbstractAfter in situ baking, Non-evaporable getter (NEG) alloys are able to pump most of the gases ...
Non-Evaporable Getter (NEG) materials are extremely useful in vacuum systems for achieving Ultra Hig...
Since 1997, Ti-Zr-V thin films have been studied to provide a solution to the problems of both press...
The new synchrotron radiation facility of the MAX IV Laboratory is under construction and expected t...
On behalf of the TS-MME-CCS section Since 1997, Ti-Zr-V thin films have been studied to provide a so...
Non-Evaporable Getter (NEG) coating has been used for years in many particle accelerators due to its...
Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 degree...
Non-evaporable getters (NEG) are widely used in ultra high vacuum (UHV) systems for particle acceler...
Non-Evaporable Getter (NEG) coating has become an integral part of particle accelerator vacuum syste...
Non Evaporable Getter (NEG) films, sputter deposited onto the internal surfaces of vacuum chambers r...
AbstractAmong several methods used to obtain ultra-high vacuum (UHV) for particles accelerators cham...
First results concerning a new approach of TiZrV non-evaporable getter (NEG) thin films coating on v...
About 25 years ago, a study on the ultra-high vacuum behaviour of Non-Evaporable Getter (NEG) strips...
MAX IV is presently under construction at Lund, Sweden, and the first beam for the production of syn...
MAX IV is presently under construction at Lund, Sweden, and the first beam for the production of syn...
AbstractAfter in situ baking, Non-evaporable getter (NEG) alloys are able to pump most of the gases ...
Non-Evaporable Getter (NEG) materials are extremely useful in vacuum systems for achieving Ultra Hig...
Since 1997, Ti-Zr-V thin films have been studied to provide a solution to the problems of both press...
The new synchrotron radiation facility of the MAX IV Laboratory is under construction and expected t...
On behalf of the TS-MME-CCS section Since 1997, Ti-Zr-V thin films have been studied to provide a so...
Non-Evaporable Getter (NEG) coating has been used for years in many particle accelerators due to its...
Sputter-deposited thin films of TiZrV are fully activated after 24 h "in situ" heating at 180 degree...