Entwicklung eines CMOS-kompatiblen Gesamtprozesses zur Herstellung integriert-optischer Schaltungen auf Silizium. Verbundprojekt 1989 - 1992 Abschlussbericht

The present final report summarizes the research results of a joint project devoted to the following topics: Integrated optics on silicon (TK Hamburg-Harburg), circuits on SiO_2/SiON/SiO_2 layers prepared by plasma- (VD and RIE etching for optical devices (Universitaet Dortmund), integration of waveguides, photo detectors, CMOS-accelerators and -circuits on a silicon chip (Universitaet Dortmund), integrated optical pressure sensors (TU Hamburg-Harburg), optical sensor device for pressure and refraction indices (Messerschmitt-Boelkow-Blohm), optimization of semiconductor lasers, joints and circuits on integrated optical chips, packaging, interferometers (Hommelwerke Sensor GmbH). (WEN)Available from TIB Hannover: RO 3532(4) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEBundesministerium fuer Forschung und Technologie (BMFT), Bonn (Germany)DEGerman