Results of atmospheric and low pressure MOVPE growth of AIAs, GaAs, InAs, GaP, InP, (AIGa)As and (AIGaIn)P structures using alternative column-III-precursors are presented. This is the first report of MOVPE growth studies for the newly developed sources: Bis-(N-Allylaminodimethylgallium), (C_1_0H_2_4N_2Ga_2); Dimethylaminopropyldimethylindium (DADI); Dimethylaminopropylalan (DAAIH_2); Trimethylaminonomethylalan, 1-(3-Diethylaminopropyl)-1-diisopropylaluminium; 1-(3-Dimehtylaminopropyl)-1-ala-cyclohexan. Electrical and optical characterization of (AIGa)As layers revealed the intramolecular alane (DAAIH-2) as an interesting group-III-precursor. In this work we have investigated the MOVPE growth of lattice matched (AIGaIn)P using standard sour...
In this paper, we describe the growth of GaAs on Si-substrates by low-pressure MOVPE for photovoltai...
AlGaAs/InGaAs modulation-doped field-effect transistors with a nominally (InAs)2(GaAs)-channel grown...
The technological development of semiconductor materials started in the period following the second ...
The main task of this project has been the test of novel As- and P-precursors with lower toxicity an...
Abstract. In this work studies of MOVPE growth of InAlGaAs/AlGaAs/GaAs heterostructures are presente...
Lattice matched GaInP/GaAs heterostructures were grown by atmospheric pressure-metal organic vapor p...
Novel three dimensional (3D) gallium structures are presented by using commercial organometallics an...
Within this project, basic studies about the metalorganic vapor phase epitaxy (MOVPE) and characteri...
Metalorganic vapour phase epitaxy is used for growth of low-dimensional III-V semiconductor structur...
III-V semiconductor quantum wells (QW) were grown by atmospheric pressure organometallic chemical va...
The structure of gallium arsenide and indium phosphide (0 0 1) surfaces in the metalorganic vapor-ph...
The present contribution is concerned with the highly lattice-mismatched growth of InPon GaAs-substr...
In this paper we present a novel growth of grade-strained bulk InGaAs/InP by linearly changing group...
The results presented in this work cover a wide range of both fundamental and applied aspects. These...
Despite the vast use of metalorganic chemical vapor deposition (MOCVD) for the growth of optical and...
In this paper, we describe the growth of GaAs on Si-substrates by low-pressure MOVPE for photovoltai...
AlGaAs/InGaAs modulation-doped field-effect transistors with a nominally (InAs)2(GaAs)-channel grown...
The technological development of semiconductor materials started in the period following the second ...
The main task of this project has been the test of novel As- and P-precursors with lower toxicity an...
Abstract. In this work studies of MOVPE growth of InAlGaAs/AlGaAs/GaAs heterostructures are presente...
Lattice matched GaInP/GaAs heterostructures were grown by atmospheric pressure-metal organic vapor p...
Novel three dimensional (3D) gallium structures are presented by using commercial organometallics an...
Within this project, basic studies about the metalorganic vapor phase epitaxy (MOVPE) and characteri...
Metalorganic vapour phase epitaxy is used for growth of low-dimensional III-V semiconductor structur...
III-V semiconductor quantum wells (QW) were grown by atmospheric pressure organometallic chemical va...
The structure of gallium arsenide and indium phosphide (0 0 1) surfaces in the metalorganic vapor-ph...
The present contribution is concerned with the highly lattice-mismatched growth of InPon GaAs-substr...
In this paper we present a novel growth of grade-strained bulk InGaAs/InP by linearly changing group...
The results presented in this work cover a wide range of both fundamental and applied aspects. These...
Despite the vast use of metalorganic chemical vapor deposition (MOCVD) for the growth of optical and...
In this paper, we describe the growth of GaAs on Si-substrates by low-pressure MOVPE for photovoltai...
AlGaAs/InGaAs modulation-doped field-effect transistors with a nominally (InAs)2(GaAs)-channel grown...
The technological development of semiconductor materials started in the period following the second ...