Entwicklung eines Stereolithographieharzes fuer elastomere Produkte

The objective of the presented thesis was the development of photopolymerizable systems, which allow the production of parts with elastic properties by means of a stereolitography apparatus. For that purpose three basically different systems have been investigated regarding their suitability for the desired purpose: A. resins based on siloxane macromonomers B. resins based on oligomeric butadiene and C. resins based on monomeric acrylates and methacrylates By means of photopolymerisation polymers with the desired elastic properties have been created using resins of the type A and C. Elongation at break values of up to 155% were achieved using e. g. methacryloxy-propyl terminated polydimethylsiloxane / n-hexylmethacrylate / ethylenglycol-dimethacrylate / 2-dimethylaminoethylmethacrylate. It wasn't possible to get the desired elastomeric products using resins of type B. The resins on siloxane basis proofed to be reacting to sluggish for the use in a stereolithography apparatus. The acrylate resins on the other hand polymerized fast enough for the stereolithography environment. Using an acrylate resin based on 2-hydroxyethylacrylate / n-decyl-methacrylate / ethylenglycoldimethacrylate experiments have been carried out to write a quadratic structure in a stereolithography apparatus. It was possible to produce a contiguous area with sufficient elastic properties. The achieveable speed of writing was by a factor of 75-100 lower than for common standard resins.SIGLEAvailable from: http://elib.tu-darmstadt.de/diss/000150/ / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekDEGerman