A heatable probe has been constructed for in-situ measurement of plasma parameters in reactive plasma coating processes. The PC controlled langmuir probe electronics allows a recording rate for a characteristic of 50 ms/scan and a potential-free measuring of the potential difference plasma-earth up to 1000 V. The probe characteristic is smoothed by a polynom filter, and from the polynom coefficients the first and second differentiation of the characteristic are obtained. The software is written in Lab-VIEW"R for the windows surface of Microsoft. Using this probe large differences in plasma densities and electron densities were found comparing two commercial magnetron sputter units and an arc evaporation unit. The plasma parameters can ...
A simple microcomputer-basedd ata acquisition systemi s set up to obtain the I-V characteristic of t...
We report the design, fabrication, and characterization of miniaturized, flush-mounted Langmuir prob...
Langmuir probe analysis of a sputtering glow discharge leads to errors in measurements due to contam...
For further optimization of material surface treatment by plasma processes, basic work has been carr...
The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma ...
Two programs, PPM (Plasma Parameter Messung) and PPA (Plasma Parameter Auswertung) are presented for...
This work provides a detailed description of a complete PC-Windows controlled Langmuir probe system ...
This work concerns the low-temperature plasma diagnostic in the dcdischarge in the cylindrical magne...
This thesis deals with the low-temperature plasma diagnostics by means of electrostatic Langmuir pro...
This experimental work is concerned with measurement of elementary characteristics of plasma - poten...
Plasma diagnostics are a very useful tool for characterizing the main parameters ofsputtering plasma...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
The characterization and control of plasma-assisted processes, has become increasingly urgent to ada...
A combined sensor for the simultaneous measurement of plasma and deposition parameters has been desi...
AbstractThe measurements of plasma parameters from inside a plasma boundary give more accurate resul...
A simple microcomputer-basedd ata acquisition systemi s set up to obtain the I-V characteristic of t...
We report the design, fabrication, and characterization of miniaturized, flush-mounted Langmuir prob...
Langmuir probe analysis of a sputtering glow discharge leads to errors in measurements due to contam...
For further optimization of material surface treatment by plasma processes, basic work has been carr...
The electron temperature, ion density, plasma potential and magnetic field are measured in a plasma ...
Two programs, PPM (Plasma Parameter Messung) and PPA (Plasma Parameter Auswertung) are presented for...
This work provides a detailed description of a complete PC-Windows controlled Langmuir probe system ...
This work concerns the low-temperature plasma diagnostic in the dcdischarge in the cylindrical magne...
This thesis deals with the low-temperature plasma diagnostics by means of electrostatic Langmuir pro...
This experimental work is concerned with measurement of elementary characteristics of plasma - poten...
Plasma diagnostics are a very useful tool for characterizing the main parameters ofsputtering plasma...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
The characterization and control of plasma-assisted processes, has become increasingly urgent to ada...
A combined sensor for the simultaneous measurement of plasma and deposition parameters has been desi...
AbstractThe measurements of plasma parameters from inside a plasma boundary give more accurate resul...
A simple microcomputer-basedd ata acquisition systemi s set up to obtain the I-V characteristic of t...
We report the design, fabrication, and characterization of miniaturized, flush-mounted Langmuir prob...
Langmuir probe analysis of a sputtering glow discharge leads to errors in measurements due to contam...