Lichtkraft-Lithographie mit Atomen. Teilvorhaben: Lichtkraftlithographie mit optischen Gittern Abschlussbericht

State-of-the-art: Until 1995 the generation of stable, periodic structures made of Chromium and Aluminum by optical lithography has been demonstrated by U.S. research groups. Scope of the present study/research: The scope of the present study has been the development of methods to generate and stabilize lateral nanostructures made by light forces, as well as the demonstration of methods to localize neutral atoms in optical lattices. Method: Atoms of a high density thermal atomic beam have been forced to interact with an optical lattice or optical standing wave. The neutral atoms have been focussed on a substrate to generate one or two-dimensional nanostructures. Results: A method to generate intense optical light fields in standing waves has been developed which can be applied in atom lithography. The localization of the atoms in the light field has been demonstrated by Bragg diffraction. Techniques to transfer a pattern into a stable structure have been provided as an positive and negative image of the original physical mask. Summary/Possible applications: The development of methods to transfer chemical active nanostructures into a metal surface may be a progress, not only for lithography by light forces. The novel process of pattern transfer enables the use of inexpensive and compact laser diode systems for the generation of nanostructures in atom lithography, which is important with respect to possible, further industrial applications. (orig.)SIGLEAvailable from TIB Hannover: DtF QN1(68,20) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekBundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany)DEGerman