Prozessuntersuchung eines innovativen Plasmaverfahrens zur Herstellung funktionell gradierter Metall-Nichtmetall-Schichten

The understanding of the plasma based processes which take place during the deposition of thin films is a prerequisite to deposit complex layer systems. The deposition of metallic and non-metallic films using dense plasmas in combination with suitable in-situ-diagnostics is described in this paper. In the experiment dense He- and Ar-plasmas were generated by a low pressure arc discharge using a hollow LaB_6-cathode in the plasma facility PETRA (plasma engineering and technology research assembly). Typical values for the density and electron temperature were n_e = 10"1"2..10"1"3 cm"-"3 and kT_e = 5..20 eV. The influence of different configurations of the magnetic field (homogeneous and cusp) were investigated in view of homogenity of the layers and the deposition rate. Usually the adhesion of non-metallic films (a-C:H) on metal substrates is limited by the high internal stresses of the coating and the poor interfacial contact between coating and substrate. A concept to improve the adhesion of coatings is to introduce a metal interlayer (Al) with a gradient transition to the non-metal coating. For the deposition of homogeneous coatings a combination of plasma assisted PVD and CVD methods was used. The coatings were characterised by SEM, EDS, TEM/TED, IR-spectroscopy, Raman-spectroscopy and SIMS analyses as well as microindentation measurements. The influence of different parameters on the plasma and the local distribution of plasma density and electron temperature were measuredDissertation by Hemel, V., 128 refs.Available from TIB Hannover: RA 831(3242) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEDEGerman