The main task of this project has been the test of novel As- and P-precursors with lower toxicity and reduced hazardous potential for the MOVPE (metal-organic vapour phase epitaxy) of (GaIn)(PAs) and (AlGaIn)P. The investigation has been concentrated on the systematic replacement of AsH_3 and PH_3 by the compounds with lower number of As-H- and/or P-H-bonds, as tertiarybutylarsane (TBAs), ditertiarybutylarsame (DitBAs), diethyltertiarybutylarsane (DEtBAs), tertiarybutylphosphane (TBP), and ditertiarybutylphosphane (DitBuPH). (GaIn)/(PAs)/InP: The electrical and optical properties of the expitaxial (GaIn)(PAs) material have proved that the novel sources are effective and equivalent substitutes for the highly toxic AsH_3 and PH_3. Only the gr...
Phosphorus-based materials are of great importance for many advanced optoelectronic and electronic d...
Low pressure metal organic vapour phase epitaxy of undoped GaAs and Al_xGa1-xAs as well as of p-dope...
The technological development of semiconductor materials started in the period following the second ...
The activities were performed in close cooperation with partners from the universities of Leipzig (0...
As part of the main point of support 'alternative precursors for the vapour phase epitaxy' we have i...
Novel group V precursors are to be chosen for MOMBE growth and tested in optoelectronic device struc...
Within this research project, we have investigated 3 novel organic phosphorus compounds as potential...
Results of atmospheric and low pressure MOVPE growth of AIAs, GaAs, InAs, GaP, InP, (AIGa)As and (AI...
Thesis (Ph. D.)--University of Rochester. Institute of Optics, 1999.Materials and device research is...
In Rahmen dieser Arbeit wurden das Wachstum und die Eigenschaften von selbstorganisierten InGaAs Qua...
L'association d'un bâti d'épitaxie par jets moléculaires aux sources gazeuses d'organométalliques em...
Metalorganic vapour phase epitaxy (MOVPE) has proven to be a successful method for growth of structu...
Arsine and phosphine were decomposed in a high temperature l ak-source to provide As2 and P2 molecul...
Studies of the reaction or decomposition products of precursors for metal organic vapour phase epita...
A new GaAs vapor-phase epitaxial (VPE) technique using trimethylgallium (TMG) and arsenic trichlorid...
Phosphorus-based materials are of great importance for many advanced optoelectronic and electronic d...
Low pressure metal organic vapour phase epitaxy of undoped GaAs and Al_xGa1-xAs as well as of p-dope...
The technological development of semiconductor materials started in the period following the second ...
The activities were performed in close cooperation with partners from the universities of Leipzig (0...
As part of the main point of support 'alternative precursors for the vapour phase epitaxy' we have i...
Novel group V precursors are to be chosen for MOMBE growth and tested in optoelectronic device struc...
Within this research project, we have investigated 3 novel organic phosphorus compounds as potential...
Results of atmospheric and low pressure MOVPE growth of AIAs, GaAs, InAs, GaP, InP, (AIGa)As and (AI...
Thesis (Ph. D.)--University of Rochester. Institute of Optics, 1999.Materials and device research is...
In Rahmen dieser Arbeit wurden das Wachstum und die Eigenschaften von selbstorganisierten InGaAs Qua...
L'association d'un bâti d'épitaxie par jets moléculaires aux sources gazeuses d'organométalliques em...
Metalorganic vapour phase epitaxy (MOVPE) has proven to be a successful method for growth of structu...
Arsine and phosphine were decomposed in a high temperature l ak-source to provide As2 and P2 molecul...
Studies of the reaction or decomposition products of precursors for metal organic vapour phase epita...
A new GaAs vapor-phase epitaxial (VPE) technique using trimethylgallium (TMG) and arsenic trichlorid...
Phosphorus-based materials are of great importance for many advanced optoelectronic and electronic d...
Low pressure metal organic vapour phase epitaxy of undoped GaAs and Al_xGa1-xAs as well as of p-dope...
The technological development of semiconductor materials started in the period following the second ...