Suitability of large caliber neutral beam sources with low energy for mild etching

As the size of very large scale integration (VLSI) circuits and semiconductor devices has been shrinking, the neutral beam will become a promissing technology for charge free and low damage etching due to its electrically neutral intrinsic property. Requirements of etching fine patterns for the etch technology are presented, advantages of the low energy neutral beam etching are assessed, the present worldwise status of neutral beam source and its etching research is surveyed, potentials and limitations of neutral beam sources are analyzed and a development suggestion of the neutral beam source and its etching is proposed in the present paper. (orig.)Available from TIB Hannover: RR 9138(5) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekSIGLEDEGerman