The project served the development of the basics of a new coating process based on a hollow cathode discharge and clarifying of possibilities of an industrial application with the subtasks source optimization (IST) and testing in an experimental coil coating system. Goal was the achievement of high layer growth rates with equivalence of the layer characteristics with those of other coating processes. Due to the determined data further estimations were made to the economy. The experiments were realized for aluminium and alumina layers. For the proof of the suitability for a coil coating process a test plant was modified accordingly. It was shown that the results of the hollow cathode discharge concerning the deposition rates and reflectance ...
EP 1575078 A UPAB: 20051011 NOVELTY - Process for surface treatment of band shaped substrates with a...
DE 10303428 A UPAB: 20040901 NOVELTY - Plasma-activated layer deposition process by cathodic sputter...
With the progression towards higher aspect ratios and finer topographical dimensions in many micro- ...
NOVELTY - A substrate is coated with at least partially crystalline aluminum oxide by hollow cathode...
Low pressure glow discharges are of strong interest for the development of new technologies for stee...
In a process for coating substrates by gas flow sputtering using a hollow cathode glow discharge in ...
A new sputter source which enables higher deposition rates than standard magnetron sputtering, espec...
The hollow cathode will be presented as a plasma source for reactive evaporation processes. The holl...
Known arc sources have, among other things, the disadvantage that macroparticles on the substrate to...
The subject matter of the present project are investigations of new coating techniques and advanced ...
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Further...
Within the project 'development of low emissivity layer systems for large area glass coating' differ...
This thesis presents experimental and modelling studies of hollow cathode discharges (HCDs). This ty...
The deposition of high-precision optical coatings by magnetron sputtering is still a demanding and c...
WO2003029511 A UPAB: 20030526 NOVELTY - Process for depositing silver-containing metal layers having...
EP 1575078 A UPAB: 20051011 NOVELTY - Process for surface treatment of band shaped substrates with a...
DE 10303428 A UPAB: 20040901 NOVELTY - Plasma-activated layer deposition process by cathodic sputter...
With the progression towards higher aspect ratios and finer topographical dimensions in many micro- ...
NOVELTY - A substrate is coated with at least partially crystalline aluminum oxide by hollow cathode...
Low pressure glow discharges are of strong interest for the development of new technologies for stee...
In a process for coating substrates by gas flow sputtering using a hollow cathode glow discharge in ...
A new sputter source which enables higher deposition rates than standard magnetron sputtering, espec...
The hollow cathode will be presented as a plasma source for reactive evaporation processes. The holl...
Known arc sources have, among other things, the disadvantage that macroparticles on the substrate to...
The subject matter of the present project are investigations of new coating techniques and advanced ...
Diploma thesis describes technology of pulse reactive magnetron sputtering of Al2O3 coating. Further...
Within the project 'development of low emissivity layer systems for large area glass coating' differ...
This thesis presents experimental and modelling studies of hollow cathode discharges (HCDs). This ty...
The deposition of high-precision optical coatings by magnetron sputtering is still a demanding and c...
WO2003029511 A UPAB: 20030526 NOVELTY - Process for depositing silver-containing metal layers having...
EP 1575078 A UPAB: 20051011 NOVELTY - Process for surface treatment of band shaped substrates with a...
DE 10303428 A UPAB: 20040901 NOVELTY - Plasma-activated layer deposition process by cathodic sputter...
With the progression towards higher aspect ratios and finer topographical dimensions in many micro- ...