Multiprocessing module based upon advanced plasma sources (ECR) Final report

Comtemporary Etching Technologies are based on plasmas in /Parallelplattenreaktoren/ (RIE-reactors). Takeing into account the requirements of production of highly integrated memory devices (as high ion energies, high gas density) current etching technologies do not allow satisfactory handling of especially critical process steps. Within the project reported now partners were confronted with the task, to develop a high density plasma source with reasonable uniformity to be integrated into a clustered module. Starting from former LH plasma source versions (ECR, CECR) in the JESSI-project E 96 an ECR plasma source was developed which overcame the previous weakness non-uniformity. With an outstanding result in non-uniformity was achieved. This result of 4% (3#sigma#) corresponds to a value of about 1,3% in previous units. Plasma source has a very simple and compact design, which - together with the use of permant magnet - makes it clusterable. This ECR-Source is excellently suited to future advanced applications with central platform technologies. The very simple design makes it easily manageable and results in low production costs. The physical properties of ECR plasma source are characterized by high ion densities combined with low gas pressures and a good separation in controlling plasma generation an ion extraction. The most important process results are anisotropic profiles, little 'microloading', excellent 0.35 #mu#m- and 0,25 #mu#m-structures (resist and hard mask), very good selectivity relative to underground, simple chemistry and outstanding non-uniformity. The process development and results as well as the diagnostic devices are reported more detailed in the reports of IBM Sindelfingen and FhG-ISit Berlin. The goals of this project are fully achieved. (orig.)SIGLEAvailable from TIB Hannover: DtF QN1(32,44) / FIZ - Fachinformationszzentrum Karlsruhe / TIB - Technische InformationsbibliothekBundesministerium fuer Bildung, Wissenschaft, Forschung und Technologie, Bonn (Germany)DEGerman