Design and synthesis of methacrylate based polymers for use as electron beam resists

Polymers in defence

Plastics and Rubber Inst., Bristol (United Kingdom). Western Section

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:87/08599(Polymers) / BLDSC - British...

Poly(fluoroalkyl methacrylates) from trifluoroethene Synthesis and properties

Watson, M.S.

January 1997

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN015189 / BLDSC - British Library D...

New polymeric resists for electron beam lithography.

Narula, Ameeta

January 1982

Multiple thin films which are conducting, insulating and semiconducting are important components of ...

An electron beam lithographic route to polyacetylene via poly(vinylchloride)

Cooley, G

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:DX91552 / BLDSC - British Library Do...

A study of poly(methyl methacrylate) as an electron beam resist.

Crosby, Vicki C.

January 1983

Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are gr...

Electron beam resists based on oxirane functionalised polystyrenes

Murphy, J. J.
Jones, R. G.
Cordina, G.

February 1997

Copolymers consisting of styrene and 4-ethenyl-phenyloxirane (epoxystyrene) can be synthesised by ra...

Characteristics of poly(methacryloyl chloride) for electron beam exposure

Nakamura, K.
Namariyama, Y.
Kinoshita, A
British Library Lending Div. (BLLD), Boston Spa (United Kingdom) frueherer Name

January 1987

Translated from Japanese (Kobunshi Ronbunshu 1980 v. 37(4) p. 299-302)SIGLEAvailable from British Li...

Com un eadon Poly(methyl O-chloracrylate) Positive Electron-Beam as a New Resist

J. N. He Lber T
C. F. Cook
E. H. Po Indexter

October 2016

Production of high density integrated circuits by electron-beam lithography relies heavily upon poly...

The synthesis and polymerization of methacrylate macronomers

Topping, C.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN031780 / BLDSC - British Library D...

Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

?????????

July 2014

A new photoacid generator (PAG) bound polymer containing triphenylsulfonium salt methacrylate (TPSMA...

Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies

V. S. V. Satyanarayana (1829068)
Felipe Kessler (1556095)
Vikram Singh (757917)
Francine R. Scheffer (1829065)
Daniel E. Weibel (1631341)
Subrata Ghosh (124413)
Kenneth E. Gonsalves (1556089)

March 2014

Polymerization of (4-(methacryloyloxy)phenyl)dimethylsulfoniumtriflate (MAPDST), as a key monomer ...

Lithographic characterisation of a selection of polymeric resists for microlithographic applications

Murphy, J.J.

January 1997

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN018312 / BLDSC - British Library D...

Advanced polymers for light emitting diodes

Webster, G.R.

January 2000

Available from British Library Document Supply Centre-DSC:D216814 / BLDSC - British Library Document...

The use of electron beam lithography and chemical etching for the fabrication of micromechanical structures

Lutwyche, M.I

January 1991

SIGLEAvailable from British Library Document Supply Centre- DSC:D062120 / BLDSC - British Library Do...

Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer

保坂勇志
近藤孝文
大山智子
内田朋哉
田口光正
吉田陽一
鷲尾方一

October 2018

α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF...

Polymers in defence

Plastics and Rubber Inst., Bristol (United Kingdom). Western Section

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:87/08599(Polymers) / BLDSC - British...

Poly(fluoroalkyl methacrylates) from trifluoroethene Synthesis and properties

Watson, M.S.

January 1997

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN015189 / BLDSC - British Library D...

New polymeric resists for electron beam lithography.

Narula, Ameeta

January 1982

Multiple thin films which are conducting, insulating and semiconducting are important components of ...

An electron beam lithographic route to polyacetylene via poly(vinylchloride)

Cooley, G

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:DX91552 / BLDSC - British Library Do...

A study of poly(methyl methacrylate) as an electron beam resist.

Crosby, Vicki C.

January 1983

Some polymers exhibit property changes when exposed to ionizing radiation. When these changes are gr...

Electron beam resists based on oxirane functionalised polystyrenes

Murphy, J. J.
Jones, R. G.
Cordina, G.

February 1997

Copolymers consisting of styrene and 4-ethenyl-phenyloxirane (epoxystyrene) can be synthesised by ra...

Characteristics of poly(methacryloyl chloride) for electron beam exposure

Nakamura, K.
Namariyama, Y.
Kinoshita, A
British Library Lending Div. (BLLD), Boston Spa (United Kingdom) frueherer Name

January 1987

Translated from Japanese (Kobunshi Ronbunshu 1980 v. 37(4) p. 299-302)SIGLEAvailable from British Li...

Com un eadon Poly(methyl O-chloracrylate) Positive Electron-Beam as a New Resist

J. N. He Lber T
C. F. Cook
E. H. Po Indexter

October 2016

Production of high density integrated circuits by electron-beam lithography relies heavily upon poly...

The synthesis and polymerization of methacrylate macronomers

Topping, C.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN031780 / BLDSC - British Library D...

Triphenylsulfonium salt methacrylate bound polymer resist for electron beam lithography

?????????

July 2014

A new photoacid generator (PAG) bound polymer containing triphenylsulfonium salt methacrylate (TPSMA...

Radiation-Sensitive Novel Polymeric Resist Materials: Iterative Synthesis and Their EUV Fragmentation Studies

V. S. V. Satyanarayana (1829068)
Felipe Kessler (1556095)
Vikram Singh (757917)
Francine R. Scheffer (1829065)
Daniel E. Weibel (1631341)
Subrata Ghosh (124413)
Kenneth E. Gonsalves (1556089)

March 2014

Polymerization of (4-(methacryloyloxy)phenyl)dimethylsulfoniumtriflate (MAPDST), as a key monomer ...

Lithographic characterisation of a selection of polymeric resists for microlithographic applications

Murphy, J.J.

January 1997

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN018312 / BLDSC - British Library D...

Advanced polymers for light emitting diodes

Webster, G.R.

January 2000

Available from British Library Document Supply Centre-DSC:D216814 / BLDSC - British Library Document...

The use of electron beam lithography and chemical etching for the fabrication of micromechanical structures

Lutwyche, M.I

January 1991

SIGLEAvailable from British Library Document Supply Centre- DSC:D062120 / BLDSC - British Library Do...

Study on Electron-beam-induced Reactions of Methyl α-Allyloxymethyl Acrylic Polymer

保坂勇志
近藤孝文
大山智子
内田朋哉
田口光正
吉田陽一
鷲尾方一

October 2018

α-Allyloxymethyl acrylic (AMA) polymers are radical-curable resins that contain tetrahydrofuran (THF...

Polymers in defence

Plastics and Rubber Inst., Bristol (United Kingdom). Western Section

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:87/08599(Polymers) / BLDSC - British...

Poly(fluoroalkyl methacrylates) from trifluoroethene Synthesis and properties

Watson, M.S.

January 1997

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN015189 / BLDSC - British Library D...

New polymeric resists for electron beam lithography.

Narula, Ameeta

January 1982

Multiple thin films which are conducting, insulating and semiconducting are important components of ...

Design and synthesis of methacrylate based polymers for use as electron beam resists

Abstract

Extracted data

Design and synthesis of methacrylate based polymers for use as electron beam resists

Abstract

Extracted data

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