Control of the properties of semiconducting thin films deposited using magnetron sputtering

Electrical properties of R.F. sputtered thin oxide films

Hilou, H.W

January 1985

SIGLEAvailable from British Library Document Supply Centre- DSC:D65915/86 / BLDSC - British Library ...

Structure and magnetic properties of thin films and superlattices

Bentall, Mark J.

January 2002

SIGLEAvailable from British Library Document Supply Centre- DSC:DN061405 / BLDSC - British Library D...

Processing of thallium based superconducting films

Su, L

January 1994

Available from British Library Document Supply Centre- DSC:D182957 / BLDSC - British Library Documen...

Novel techniques for the control of the properties of reactively sputtered thin films

Danson, N.

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN012268 / BLDSC - British Library D...

Optimization of glow discharge magnetron sputtering for deposition of high Tc superconducting thin films

Ramezani-Namin, M.

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN017645 / BLDSC - British Library D...

Characterisation of a magnetron discharge used in the production of thin film superconductors

Burns, B.F

January 1992

SIGLEAvailable from British Library Document Supply Centre- DSC:DXN1189 / BLDSC - British Library Do...

Superconductive thin films and devices Some developments and applications

Morris, G.W

January 1988

SIGLEAvailable from British Library Document Supply Centre- DSC:D59743 / BLDSC - British Library Doc...

Preparation of metal oxide films by D.C. and R.F. magnetron sputtering

Deshpandey, C

January 1981

Available from British Library Document Supply Centre- DSC:D42666/82 / BLDSC - British Library Docum...

The deposition of high temperature superconducting thin films

Lai, H

January 1992

SIGLEAvailable from British Library Document Supply Centre- DSC:D173849 / BLDSC - British Library Do...

Epitaxial growth of sputtered thin films

Huang, K.H

January 1991

SIGLEAvailable from British Library Document Supply Centre- DSC:D60678 / BLDSC - British Library Doc...

Production of nickel oxide thin films by magnetron sputtering

Harris, A.W
UKAEA Atomic Energy Establishment, Harwell (United Kingdom). Materials Development Div

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:9091.9(AERE-R--13668) / BLDSC - Brit...

Construction of sputtering system and preparation of high temperature superconducting thin films

Kaynak, E

January 2000

The preparation of high T sub c superconducting thin film is important both for the understanding of...

Stucture and properties of sputter deposited Y-Ba-Cu-O thin films

Mingard, K.P

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:D78816 / BLDSC - British Library Doc...

Control of the properties of semiconducting thin films deposited using magnetron sputtering

Gareth W. Hall (7172081)

January 1993

The objective of the work was to deposit semiconducting thin films with controlled properties using ...

The production of porous and chemically reactive coatings by magnetron sputtering

O'Brien, J.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN018862 / BLDSC - British Library D...

Electrical properties of R.F. sputtered thin oxide films

Hilou, H.W

January 1985

SIGLEAvailable from British Library Document Supply Centre- DSC:D65915/86 / BLDSC - British Library ...

Structure and magnetic properties of thin films and superlattices

Bentall, Mark J.

January 2002

SIGLEAvailable from British Library Document Supply Centre- DSC:DN061405 / BLDSC - British Library D...

Processing of thallium based superconducting films

Su, L

January 1994

Available from British Library Document Supply Centre- DSC:D182957 / BLDSC - British Library Documen...

Novel techniques for the control of the properties of reactively sputtered thin films

Danson, N.

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN012268 / BLDSC - British Library D...

Optimization of glow discharge magnetron sputtering for deposition of high Tc superconducting thin films

Ramezani-Namin, M.

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN017645 / BLDSC - British Library D...

Characterisation of a magnetron discharge used in the production of thin film superconductors

Burns, B.F

January 1992

SIGLEAvailable from British Library Document Supply Centre- DSC:DXN1189 / BLDSC - British Library Do...

Superconductive thin films and devices Some developments and applications

Morris, G.W

January 1988

SIGLEAvailable from British Library Document Supply Centre- DSC:D59743 / BLDSC - British Library Doc...

Preparation of metal oxide films by D.C. and R.F. magnetron sputtering

Deshpandey, C

January 1981

Available from British Library Document Supply Centre- DSC:D42666/82 / BLDSC - British Library Docum...

The deposition of high temperature superconducting thin films

Lai, H

January 1992

SIGLEAvailable from British Library Document Supply Centre- DSC:D173849 / BLDSC - British Library Do...

Epitaxial growth of sputtered thin films

Huang, K.H

January 1991

SIGLEAvailable from British Library Document Supply Centre- DSC:D60678 / BLDSC - British Library Doc...

Production of nickel oxide thin films by magnetron sputtering

Harris, A.W
UKAEA Atomic Energy Establishment, Harwell (United Kingdom). Materials Development Div

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:9091.9(AERE-R--13668) / BLDSC - Brit...

Construction of sputtering system and preparation of high temperature superconducting thin films

Kaynak, E

January 2000

The preparation of high T sub c superconducting thin film is important both for the understanding of...

Stucture and properties of sputter deposited Y-Ba-Cu-O thin films

Mingard, K.P

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:D78816 / BLDSC - British Library Doc...

Control of the properties of semiconducting thin films deposited using magnetron sputtering

Gareth W. Hall (7172081)

January 1993

The objective of the work was to deposit semiconducting thin films with controlled properties using ...

The production of porous and chemically reactive coatings by magnetron sputtering

O'Brien, J.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN018862 / BLDSC - British Library D...

Electrical properties of R.F. sputtered thin oxide films

Hilou, H.W

January 1985

SIGLEAvailable from British Library Document Supply Centre- DSC:D65915/86 / BLDSC - British Library ...

Structure and magnetic properties of thin films and superlattices

Bentall, Mark J.

January 2002

SIGLEAvailable from British Library Document Supply Centre- DSC:DN061405 / BLDSC - British Library D...

Processing of thallium based superconducting films

Su, L

January 1994

Available from British Library Document Supply Centre- DSC:D182957 / BLDSC - British Library Documen...

Control of the properties of semiconducting thin films deposited using magnetron sputtering

Abstract

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Control of the properties of semiconducting thin films deposited using magnetron sputtering

Abstract

Extracted data

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