Modification of metal contacts to hydrogenated amorphous silicon by ion bombardment

Amorphous metal diffusion barriers for semiconductor contacts

Boothroyd, C.B

January 1986

SIGLEAvailable from British Library Document Supply Centre- DSC:D59236 / BLDSC - British Library Doc...

Passivation of amorphous and polycrystalline metals

Davenport, A.J

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:D59591 / BLDSC - British Library Doc...

Modification of th surface mechanical properties of ceramic materials by ion implantation

Roberts, S.G
Cambridge Univ. (United Kingdom)

January 1982

Available from British Library Lending Division - LD:D52837/84 / BLDSC - British Library Document Su...

Modifications des caractéristiques électriques de contacts métal-silicium par bombardement d'ions argon de faible énergie

A. Chouiyakh
B. Lang

January 1984

Argon ion bombardment changes completely the nature of metal-Si contacts : the metal-Si(n) contact b...

Metallised reaction and ohmic contacts to semiconductors

Grovenor, C

January 1980

SIGLEAvailable from British Library Document Supply Centre- DSC:D39407/82 / BLDSC - British Library ...

Metal-to-semiconductor contacts

Fanthorpe, S.D.P

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:DX170625 / BLDSC - British Library D...

Modification of the surface mechanical properties of ceramic materials by ion implantation

Roberts, S

January 1982

SIGLEAvailable from British Library Document Supply Centre- DSC:D52837/84 / BLDSC - British Library ...

Ion beam mixing in amorphous silicon

Jafri, Z.H

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:DX91473 / BLDSC - British Library Do...

Some aspects of silicon surface modification and oxide removal

Thornton, J.M

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:DX171888 / BLDSC - British Library D...

Investigation of the effects of low energy high dose ion bombardment in metals and compound semiconductors

Sanghera, H.K.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN026119 / BLDSC - British Library D...

Properties of chromium silicide on hydrogenated amorphous silicon

Kovsarian, A.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN019715 / BLDSC - British Library D...

Ion bombardment induced deposition of tungsten

McLaren, M

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN005979 / BLDSC - British Library D...

Laser irradiation of hydrogenated amorphous silicon

Hassan, Y.M.

January 1983

SIGLELD:D49044/84 / BLDSC - British Library Document Supply CentreGBUnited Kingdo

Novel deposition of doped amorphous silicon and related materials

Miyajima, S.

January 1994

SIGLEAvailable from British Library Document Supply Centre-DSC:D064043 / BLDSC - British Library Doc...

Modification of metal contacts to hydrogenated amorphous silicon by ion bombardment.

Chai, Meng Koon.

June 2018

This thesis is concerned with the formation, characterisation and application of doped surface layer...

Amorphous metal diffusion barriers for semiconductor contacts

Boothroyd, C.B

January 1986

SIGLEAvailable from British Library Document Supply Centre- DSC:D59236 / BLDSC - British Library Doc...

Passivation of amorphous and polycrystalline metals

Davenport, A.J

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:D59591 / BLDSC - British Library Doc...

Modification of th surface mechanical properties of ceramic materials by ion implantation

Roberts, S.G
Cambridge Univ. (United Kingdom)

January 1982

Available from British Library Lending Division - LD:D52837/84 / BLDSC - British Library Document Su...

Modifications des caractéristiques électriques de contacts métal-silicium par bombardement d'ions argon de faible énergie

A. Chouiyakh
B. Lang

January 1984

Argon ion bombardment changes completely the nature of metal-Si contacts : the metal-Si(n) contact b...

Metallised reaction and ohmic contacts to semiconductors

Grovenor, C

January 1980

SIGLEAvailable from British Library Document Supply Centre- DSC:D39407/82 / BLDSC - British Library ...

Metal-to-semiconductor contacts

Fanthorpe, S.D.P

January 1989

SIGLEAvailable from British Library Document Supply Centre- DSC:DX170625 / BLDSC - British Library D...

Modification of the surface mechanical properties of ceramic materials by ion implantation

Roberts, S

January 1982

SIGLEAvailable from British Library Document Supply Centre- DSC:D52837/84 / BLDSC - British Library ...

Ion beam mixing in amorphous silicon

Jafri, Z.H

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:DX91473 / BLDSC - British Library Do...

Some aspects of silicon surface modification and oxide removal

Thornton, J.M

January 1990

SIGLEAvailable from British Library Document Supply Centre- DSC:DX171888 / BLDSC - British Library D...

Investigation of the effects of low energy high dose ion bombardment in metals and compound semiconductors

Sanghera, H.K.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN026119 / BLDSC - British Library D...

Properties of chromium silicide on hydrogenated amorphous silicon

Kovsarian, A.

January 1998

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN019715 / BLDSC - British Library D...

Ion bombardment induced deposition of tungsten

McLaren, M

January 1996

SIGLEAvailable from British Library Document Supply Centre-DSC:DXN005979 / BLDSC - British Library D...

Laser irradiation of hydrogenated amorphous silicon

Hassan, Y.M.

January 1983

SIGLELD:D49044/84 / BLDSC - British Library Document Supply CentreGBUnited Kingdo

Novel deposition of doped amorphous silicon and related materials

Miyajima, S.

January 1994

SIGLEAvailable from British Library Document Supply Centre-DSC:D064043 / BLDSC - British Library Doc...

Modification of metal contacts to hydrogenated amorphous silicon by ion bombardment.

Chai, Meng Koon.

June 2018

This thesis is concerned with the formation, characterisation and application of doped surface layer...

Amorphous metal diffusion barriers for semiconductor contacts

Boothroyd, C.B

January 1986

SIGLEAvailable from British Library Document Supply Centre- DSC:D59236 / BLDSC - British Library Doc...

Passivation of amorphous and polycrystalline metals

Davenport, A.J

January 1987

SIGLEAvailable from British Library Document Supply Centre- DSC:D59591 / BLDSC - British Library Doc...

Modification of th surface mechanical properties of ceramic materials by ion implantation

Roberts, S.G
Cambridge Univ. (United Kingdom)

January 1982

Available from British Library Lending Division - LD:D52837/84 / BLDSC - British Library Document Su...

Modification of metal contacts to hydrogenated amorphous silicon by ion bombardment

Abstract

Extracted data

Modification of metal contacts to hydrogenated amorphous silicon by ion bombardment

Abstract

Extracted data

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