Low temperature pulsed plasma deposition Part 1; a new technique for thin film deposition with complete gas dissociation

Scarsbrook, G.A.
Llewellyn, I.P.
Ojha, S.M.
Heinecke, R.A
STC Technology Ltd., Harlow (United Kingdom). Systems Components Div

Publication date

January 1988

Abstract

Paper at European Vacuum Conference, Salford (GB) 11-15 Apr 1988Available from British Library Document Supply Centre- DSC:0678.2310F(AD-A--195-523)microfiche / BLDSC - British Library Document Supply CentreSIGLEGBUnited Kingdo

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Low temperature pulsed plasma deposition Part 1; a new technique for thin film deposition with complete gas dissociation

Abstract

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Low temperature pulsed plasma deposition Part 1; a new technique for thin film deposition with complete gas dissociation

Abstract

Extracted data

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