This thesis examines the radiative transfer of extreme ultra-violet (EUV) lasers in plasmas. Harmonic generation, free electron lasers and plasma-based EUV lasers are first reviewed. The accuracy of the Linford formula used to evaluate amplified spontaneous emission (ASE) is examined. A quantitative discussion of backlighters is presented. The maximum plasma thickness able to be probed using extreme ultraviolet (EUV) and harder (1 keV) x-rays is evaluated. It is shown that at higher plasma temperatures (~ 200 eV), EUV radiation (e.g. photon energy = 89 eV) can probe greater optical depth of plasma than x-ray radiation (e.g. photon energy = 1243 eV). The effect of a seed beam injected into an amplifier plasma medium is investigated. TJ1e var...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
This thesis explores the applications of extreme ultra-violet (EUV) radiation to the probing of plas...
Laser-plasma studies have been undertaken for 50 years using infra-red to ultra-violet lasers. We sh...
Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet...
Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet...
This work describes the generation and matter interactions of laser radiation with wavelengths betwe...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
This work describes the generation and matter interactions of laser radiation with wavelengths betwe...
This thesis explores the applications of extreme ultra-violet (EUV) radiation to the probing of plas...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
This thesis explores the applications of extreme ultra-violet (EUV) radiation to the probing of plas...
Laser-plasma studies have been undertaken for 50 years using infra-red to ultra-violet lasers. We sh...
Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet...
Ionization in experiments where solid targets are irradiated by high irradiance extreme ultra-violet...
This work describes the generation and matter interactions of laser radiation with wavelengths betwe...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
This work describes the generation and matter interactions of laser radiation with wavelengths betwe...
This thesis explores the applications of extreme ultra-violet (EUV) radiation to the probing of plas...
An experimental study of laser-produced plasmas is performed by irradiating a planar tin target by l...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The majority of the studies on laser-produced plasmas as an efficient extreme ultraviolet (EUV) ligh...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...
The light source in extreme ultraviolet (EUV) lithography tools is a hot and dense laser-driven plas...