In this article, a multiscale investigation of few graphene layers grown on 6H-SiC(000-1) under ultrahigh vacuum (UHV) conditions is presented. At 100-mu m scale, the authors show that the UHV growth yields few layer graphene (FLG) with an average thickness given by Auger spectroscopy between 1 and 2 graphene planes. At the same scale, electron diffraction reveals a significant rotational disorder between the first graphene layer and the SiC surface, although well-defined preferred orientations exist. This is confirmed at the nanometer scale by scanning tunneling microscopy (STM). Finally, STM (at the nm scale) and Raman spectroscopy (at the mu m scale) show that the FLG stacking is turbostratic, and that the domain size of the crystallites...
Because of its high compatibility with conventional microfabrication processing technology, epitaxia...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
In this article, a multiscale investigation of few graphene layers grown on 6H-SiC(000-1) under ultr...
In this work, we report a multi-scale investigation using several nano-, micro and macro-scale techn...
The properties of epitaxial graphene on the C-face of SiC are investigated using comprehensive struc...
This article explores the growth of graphene under low-pressure Ar conditions. Carbon- and silicon-f...
The formation of graphene on the (0001) surface of SiC (the Si-face) is studied by atomic force micr...
Epitaxial carbon was grown by heating (000 (1) over bar) silicon carbide (SiC) to high temperatures ...
Homogeneous large-area graphene monolayers were successfully prepared ex situ on 6H-SiC(0001). The s...
The growth of graphene on SiC/Si substrates is an appealing alternative to the growth on bulk SiC fo...
International audienceThe early stage of graphene formation on the 6H-SiC 0001¯ surface is investiga...
73.20.-r 68.55.-aInternational audienceThe early stages of the graphitization of the 6H-SiC(000N1) (...
The formation of epitaxial graphene on SiC(0001) surfaces is studied using atomic force microscopy, ...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
Because of its high compatibility with conventional microfabrication processing technology, epitaxia...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
In this article, a multiscale investigation of few graphene layers grown on 6H-SiC(000-1) under ultr...
In this work, we report a multi-scale investigation using several nano-, micro and macro-scale techn...
The properties of epitaxial graphene on the C-face of SiC are investigated using comprehensive struc...
This article explores the growth of graphene under low-pressure Ar conditions. Carbon- and silicon-f...
The formation of graphene on the (0001) surface of SiC (the Si-face) is studied by atomic force micr...
Epitaxial carbon was grown by heating (000 (1) over bar) silicon carbide (SiC) to high temperatures ...
Homogeneous large-area graphene monolayers were successfully prepared ex situ on 6H-SiC(0001). The s...
The growth of graphene on SiC/Si substrates is an appealing alternative to the growth on bulk SiC fo...
International audienceThe early stage of graphene formation on the 6H-SiC 0001¯ surface is investiga...
73.20.-r 68.55.-aInternational audienceThe early stages of the graphitization of the 6H-SiC(000N1) (...
The formation of epitaxial graphene on SiC(0001) surfaces is studied using atomic force microscopy, ...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
Because of its high compatibility with conventional microfabrication processing technology, epitaxia...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...
Graphene was grown on the C-face of nominally on-axis SiC substrates using high-temperature sublimat...