Refractory transition-metal (TM) diborides have high melting points, excellent hardness, and good chemical stability. However, these properties are not sufficient for applications involving extreme environments that require high mechanical strength as well as oxidation and corrosion resistance. Here, we study the effect of Cr addition on the properties of ZrB2-rich Zr1-xCrxBy thin films grown by hybrid high-power impulse and dc magnetron co-sputtering (Cr-HiPIMS/ZrB2-DCMS) with a 100-V Cr-metal-ion synchronized potential. Cr metal fraction, x = Cr/(Zr+Cr), is increased from 0.23 to 0.44 by decreasing the power Pzrb2 applied to the DCMS ZrB2 target from 4000 to 2000 W, while the average power, pulse width, and frequency applied to the Hi...
Reactive RF-magnetron sputtering is used to grow Cr0.28Zr0.10O0.61 coatings at 500 degrees C. Coatin...
We recently showed that Zr1−xTaxBy thin films have columnar nanostructure in which column boundaries...
Cr–Al–N coatings with Zr alloying (Zr contents from 0 to 29.5 at.%) were deposited by d.c. reactive ...
Refractory transition-metal (TM) diborides have high melting points, excellent hardness, and good c...
Refractory transition-metal (TM) diborides have high melting points, excellent hardness, and good ch...
We study microstructure, mechanical, and corrosion properties of Zr1-xCrxBy coatings deposited by hy...
We study microstructure, mechanical, and corrosion properties of Zr1-xCrxBy coatings deposited by hy...
Refractory transition-metal diborides exhibit inherent hardness. However, this is not always suffici...
Zirconium diboride (ZrB2) films have been deposited by direct current magnetron sputtering (DCMS) fr...
Zirconium diboride (ZrB2) exhibits high hardness and high melting point, which is beneficial for app...
We recently showed that sputter-deposited Zr1-xTaxBy thin films have hexagonal AlB2-type columnar na...
We recently showed that sputter-deposited Zr1-xTaxBy thin films have hexagonal AlB2-type columnar na...
Zirconium diboride, ZrB2, is a ceramic material with bulk properties such as high melting point (324...
ZrB2 thin films were grown on Si by high power impulse magnetron sputtering (HiPIMS) from a compound...
International audienceMn+1AXn phases (MAX-phases), ternary compounds where M denotes an early transi...
Reactive RF-magnetron sputtering is used to grow Cr0.28Zr0.10O0.61 coatings at 500 degrees C. Coatin...
We recently showed that Zr1−xTaxBy thin films have columnar nanostructure in which column boundaries...
Cr–Al–N coatings with Zr alloying (Zr contents from 0 to 29.5 at.%) were deposited by d.c. reactive ...
Refractory transition-metal (TM) diborides have high melting points, excellent hardness, and good c...
Refractory transition-metal (TM) diborides have high melting points, excellent hardness, and good ch...
We study microstructure, mechanical, and corrosion properties of Zr1-xCrxBy coatings deposited by hy...
We study microstructure, mechanical, and corrosion properties of Zr1-xCrxBy coatings deposited by hy...
Refractory transition-metal diborides exhibit inherent hardness. However, this is not always suffici...
Zirconium diboride (ZrB2) films have been deposited by direct current magnetron sputtering (DCMS) fr...
Zirconium diboride (ZrB2) exhibits high hardness and high melting point, which is beneficial for app...
We recently showed that sputter-deposited Zr1-xTaxBy thin films have hexagonal AlB2-type columnar na...
We recently showed that sputter-deposited Zr1-xTaxBy thin films have hexagonal AlB2-type columnar na...
Zirconium diboride, ZrB2, is a ceramic material with bulk properties such as high melting point (324...
ZrB2 thin films were grown on Si by high power impulse magnetron sputtering (HiPIMS) from a compound...
International audienceMn+1AXn phases (MAX-phases), ternary compounds where M denotes an early transi...
Reactive RF-magnetron sputtering is used to grow Cr0.28Zr0.10O0.61 coatings at 500 degrees C. Coatin...
We recently showed that Zr1−xTaxBy thin films have columnar nanostructure in which column boundaries...
Cr–Al–N coatings with Zr alloying (Zr contents from 0 to 29.5 at.%) were deposited by d.c. reactive ...