Thesis (M.Sc. (Chemistry))--North-West University, Potchefstroom Campus, 2009.Silicon carbide (SiC) is formed from methyltrichlorosilane (CH3SiCI3) during a chemical vapour deposition process [Osterhold et al., 1994]. Silicon carbide is one of the important compounds for the Pebble Bed Modular Reactor (PBMR) process because it is used as a coating film in the kernel of the fuel cell. For the current chemical vapor deposition process at the PBMR to be improved, the process of the formation of silicon carbide layer from methyltrichlorosilane must be fully understood. Molecular mechanics, semi empirical, Hatree-Fock and Moller-Plesset modelling calculations were performed using the Spartan modelling program to obtain information about the mole...
The work conducted for this thesis involved investigating reactions of species containing Si-O bonds...
The gas-phase thermal reactions during disilane decomposition at low pressure chemical v por deposit...
Time resolved studies of silylene, SiH2, generated by the 193 nm laser. ash photolysis of phenylsila...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
Trichlorosilane is the most used precursor to deposit silicon for photovoltaic applications. Despite...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
Structures and energies of the gas-phase species produced during and after the various unimolecular ...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing bot...
The Direct Process is the most prominent method for producing dimethyldichlorosilane, and is a coppe...
The Direct Process is the most prominent method for producing dimethyldichlorosilane, and is a coppe...
Evidence for the specific species of benzyltriethoxysilane derivatives with a high-coordination sili...
The 600-515 nm electronic band system of the jet-cooled SiCCl free radical has been studied by laser...
With a view toward laser isotope separation of Si, we have studied infrared multiphoton dissociation...
The work conducted for this thesis involved investigating reactions of species containing Si-O bonds...
The gas-phase thermal reactions during disilane decomposition at low pressure chemical v por deposit...
Time resolved studies of silylene, SiH2, generated by the 193 nm laser. ash photolysis of phenylsila...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
Trichlorosilane is the most used precursor to deposit silicon for photovoltaic applications. Despite...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
Structures and energies of the gas-phase species produced during and after the various unimolecular ...
The rate constants for the gas-phase reactions in the silicon carbide chemical vapor deposition of m...
CH3SiCl3 (methyltrichlorosilane) (MTS) is one of the most important precursors for manufacturing bot...
The Direct Process is the most prominent method for producing dimethyldichlorosilane, and is a coppe...
The Direct Process is the most prominent method for producing dimethyldichlorosilane, and is a coppe...
Evidence for the specific species of benzyltriethoxysilane derivatives with a high-coordination sili...
The 600-515 nm electronic band system of the jet-cooled SiCCl free radical has been studied by laser...
With a view toward laser isotope separation of Si, we have studied infrared multiphoton dissociation...
The work conducted for this thesis involved investigating reactions of species containing Si-O bonds...
The gas-phase thermal reactions during disilane decomposition at low pressure chemical v por deposit...
Time resolved studies of silylene, SiH2, generated by the 193 nm laser. ash photolysis of phenylsila...