A diagnostic complex based on a magnetron sputtering device is proposed for studying a magnetron discharge plasma parameter by optical emission spectroscopy, using two spectroscopic systems: photographic and photoelectric. Software for digital processing of the obtained emission spectra is developed. The results obtained by the two spectroscopic systems are compared
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron...
International audienceThe aim of the studyis to developa software to control in real time the thin f...
Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is st...
Plasma Characterization Using Optical Emission Spectroscopy Abstract Magnetron sputtering is a w...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
The magnetron sputter tool has been employed for many years to manufacture engineering-quality thin ...
Optical emission spectroscopy (OES) combined with the models of plasma light emission becomes nonint...
Tato bakalářská práce je zaměřena na diagnostiku pulzních výbojů při depozici vrstev prostřednictvím...
Tato bakalářská práce je zaměřena na diagnostiku pulzních výbojů při depozici vrstev prostřednictvím...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
In this work, different methods employed for the analysis of emission spectra are presented -- The p...
Pour un bon contrôle du procédé de dépôt par pulvérisation magnétron et donc des propriétés des film...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron...
International audienceThe aim of the studyis to developa software to control in real time the thin f...
Plasma parameters (excitation temperature and electron density) of pulsing magnetron discharge is st...
Plasma Characterization Using Optical Emission Spectroscopy Abstract Magnetron sputtering is a w...
The magnetron is a weakly magnetised plasma source used for physical vapour deposition to produce hi...
The magnetron sputter tool has been employed for many years to manufacture engineering-quality thin ...
Optical emission spectroscopy (OES) combined with the models of plasma light emission becomes nonint...
Tato bakalářská práce je zaměřena na diagnostiku pulzních výbojů při depozici vrstev prostřednictvím...
Tato bakalářská práce je zaměřena na diagnostiku pulzních výbojů při depozici vrstev prostřednictvím...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
Pulsed DC operation of magnetrons is a relatively new sputtering technique that significantly improv...
In this work, different methods employed for the analysis of emission spectra are presented -- The p...
Pour un bon contrôle du procédé de dépôt par pulvérisation magnétron et donc des propriétés des film...
Magnetron sputtering belongs to the most important methods of production of thin films with a wide r...
The ion to neutral ratio of the sputtered material have been studied for high power pulsed magnetron...
International audienceThe aim of the studyis to developa software to control in real time the thin f...