Ti-B-N films with a gradient in the chemical composition were deposited onto austenic stainless steel sheets by means of unbalanced DC magnetron co-sputtering using a segmented TiN/Tib2 target. Film microstructure was characterized by means of electron-probe microanalysis (EPMA), transmission electron microscopy (TEM), electron energy-loss spectroscopy (EELS), and X-ray diffraction (XRD) as well as glancing angle X-ray diffraction (GAXRD). The mechanical properties of the coatings were measured using a depth-sensing nanoindenter. The composition of the films was found to lie close to the quasi-bianary section Ti-B-N. The grain size determined from TEM investigations range between 3 and 5 nm. Coatings consisted of a nanocrystalline fcc TiN p...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material ...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
Ti-B-N coatings with a three phase TiB2+TiN+BN composition have been deposited by reactive magnetron...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
TiB2 coating comprises a large number of ionic and covalent bonds, conferring it with excellent prop...
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The fi...
Binary nitrides (TiN and CrN) and ternary nitrides (TiAlN and CrAlN) have become excellent coatings ...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
[[abstract]]Nanocrystalline TiN thin films were deposited on AISI D2 steel substrates using unbalanc...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material ...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
There is a growing interest for thin film coatings for dry machining technologies which display both...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material ...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
Ti-B-N coatings with a three phase TiB2+TiN+BN composition have been deposited by reactive magnetron...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
TiB2 coating comprises a large number of ionic and covalent bonds, conferring it with excellent prop...
Titanium nitride (TiN) coatings were deposited by d.c. reactive magnetron sputtering process. The fi...
Binary nitrides (TiN and CrN) and ternary nitrides (TiAlN and CrAlN) have become excellent coatings ...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
[[abstract]]Nanocrystalline TiN thin films were deposited on AISI D2 steel substrates using unbalanc...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material ...
Ti–B–(N) coatings have been deposited by DC magnetron sputtering using TiB2 targets in Ar/N2 gas mix...
There is a growing interest for thin film coatings for dry machining technologies which display both...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material ...
Nanocomposite Ti-TiN coatings were deposited on Si (100) substrates using pulsed DC magnetron sputte...