Ti-B-N coatings with a three phase TiB2+TiN+BN composition have been deposited by reactive magnetron sputtering. XPS/AES/GAXRD and EXAFS have been employed to characterise the films and understand the relation between chemical composition and microstructure. The Ti based phases are dominated by the presence of nanocrystalline TiB2, the grain size of which decreases to an unmeasurably low value with increasing N content. Evidence of TiB2, TiN and BN bonding is found in the XPS spectra and the phase composition has been found to be in good agreement with that predicted by the phase diagram. The BN phase present is shown by XPS and AES to be h-BN.JRC.(IAM)-Institute For Advanced Material
TiB2 coating comprises a large number of ionic and covalent bonds, conferring it with excellent prop...
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios suc...
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at va...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
The structure of sputter deposited Ti-B-N thin films of three different compositions has been invest...
Ti-B-N films with a gradient in the chemical composition were deposited onto austenic stainless stee...
There is a growing interest for thin film coatings for dry machining technologies which display both...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
Hard protective coatings are commonly subjected to temperatures exceeding 1000 °C, which has signifi...
TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency...
Nitrides (such as BN and TiN) are widely used in various industrial applications because of their ex...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
TiAlBN nanocomposite coating have been successfully deposited on AISI 316 substrate via RF magnetro...
Ti x Nb 1-x N coatings have been deposited onto silicon substrates using reactive DC co-sputtering o...
TiB2 coating comprises a large number of ionic and covalent bonds, conferring it with excellent prop...
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios suc...
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at va...
A series of Ti–B–(N) coatings prepared by dc magnetron sputtering using TiB2 targets in Ar/N2 gas mi...
The structure of sputter deposited Ti-B-N thin films of three different compositions has been invest...
Ti-B-N films with a gradient in the chemical composition were deposited onto austenic stainless stee...
There is a growing interest for thin film coatings for dry machining technologies which display both...
International audienceThin films of Ti1−xAlxN nitrides were prepared over a large range of compositi...
The purpose of this study is to develop and characterize Ti-B-N deposits developed by magnetron sput...
Hard protective coatings are commonly subjected to temperatures exceeding 1000 °C, which has signifi...
TiAlBN coatings have been deposited at varying bias voltage of 0, -60, and -150 V by radio frequency...
Nitrides (such as BN and TiN) are widely used in various industrial applications because of their ex...
Titanium–boron–nitrogen (Ti–B–N) films were deposited by DC reactive magnetron sputtering using sing...
TiAlBN nanocomposite coating have been successfully deposited on AISI 316 substrate via RF magnetro...
Ti x Nb 1-x N coatings have been deposited onto silicon substrates using reactive DC co-sputtering o...
TiB2 coating comprises a large number of ionic and covalent bonds, conferring it with excellent prop...
Ti–Si–B–C–N film was deposited by DC magnetron sputtering at different argon and nitrogen ratios suc...
Nanolayered multilayer coatings of TiN/NbN and TiAlN/TiN were deposited on Si (100) substrates at va...