AlGaN/GaN HFETs and silicon MOSFETs have been integrated monolithically on a silicon <111> substrate. A differential heteroepitaxy technique was used to grow AlGaN/GaN HFET layers on silicon <111> substrates while leaving protected areas of atomically smooth silicon in which MOSFETs are built.Peer reviewed: YesNRC publication: Ye
A crack-free AlGaN/GaN heterostructure was grown on 4-inch Si (111) substrate with initial dot-like ...
peer reviewedIn the current work the performance of AlGaN/GaN HEMTs fabricated on silicon substrates...
The seamless integration of AlGaN/GaN transistors and Si CMOS electronics on the same chip will revo...
A process for monolithically integrating MOS and AlGaN/GaN HFETs has been developed using a windowed...
L’intégration monolithique hétérogène de composants III-N sur silicium (Si) offre de nombreuses poss...
A novel windowed growth technique that allows for the exposure of a smooth silicon surface for MOS c...
Due to the difficulty of GaN epitaxy growth on Si(001) substrate, GaN-on-Si wafers are generally gro...
The first on-wafer integration of Si(100) MOSFETs and AlGaN/GaN high electron mobility transistors (...
The integration of III-V compound semiconductors and silicon (100) CMOS technologies has been a long...
We present results on the direct monolithic integration of III-V devices and Si CMOS on a silicon su...
GaN HEMT has attracted a lot of attention in recent years owing to its wide applications from the hi...
The AlGaN/GaN-based high-electron-mobility transistors (HEMTs) are suitable for discrete components ...
AlGaN/GaN high electron mobility transistor (HEMT) hetero-structures were grown on the 2-in Si (1 1 ...
GaN buffers were deposited on (111)−oriented silicon (Si) by AIXTRON metal organic vapour phase epit...
By employing a single AlGaN layer with low Al composition, high quality and uniformity AlGaN/GaN het...
A crack-free AlGaN/GaN heterostructure was grown on 4-inch Si (111) substrate with initial dot-like ...
peer reviewedIn the current work the performance of AlGaN/GaN HEMTs fabricated on silicon substrates...
The seamless integration of AlGaN/GaN transistors and Si CMOS electronics on the same chip will revo...
A process for monolithically integrating MOS and AlGaN/GaN HFETs has been developed using a windowed...
L’intégration monolithique hétérogène de composants III-N sur silicium (Si) offre de nombreuses poss...
A novel windowed growth technique that allows for the exposure of a smooth silicon surface for MOS c...
Due to the difficulty of GaN epitaxy growth on Si(001) substrate, GaN-on-Si wafers are generally gro...
The first on-wafer integration of Si(100) MOSFETs and AlGaN/GaN high electron mobility transistors (...
The integration of III-V compound semiconductors and silicon (100) CMOS technologies has been a long...
We present results on the direct monolithic integration of III-V devices and Si CMOS on a silicon su...
GaN HEMT has attracted a lot of attention in recent years owing to its wide applications from the hi...
The AlGaN/GaN-based high-electron-mobility transistors (HEMTs) are suitable for discrete components ...
AlGaN/GaN high electron mobility transistor (HEMT) hetero-structures were grown on the 2-in Si (1 1 ...
GaN buffers were deposited on (111)−oriented silicon (Si) by AIXTRON metal organic vapour phase epit...
By employing a single AlGaN layer with low Al composition, high quality and uniformity AlGaN/GaN het...
A crack-free AlGaN/GaN heterostructure was grown on 4-inch Si (111) substrate with initial dot-like ...
peer reviewedIn the current work the performance of AlGaN/GaN HEMTs fabricated on silicon substrates...
The seamless integration of AlGaN/GaN transistors and Si CMOS electronics on the same chip will revo...