Multiple conduction states in ultra-thin SiO 2 films after hard breakdown could be observed when the oxides exhibited the behavior of multiple snapbacks. Although the I-V characteristics seem very complicated when the snapbacks occurred with multiple conduction states involved, a careful modeling indicates that each conduction state was well defined. The I-V characteristic of each conduction state can be well modeled by the power law, and a convincing linear dependence is observed for each state when the I-V characteristics are plotted in log-log scale. These findings consist with the percolation model.link_to_subscribed_fulltex
The physical origin of post soft breakdown (SBD) current saturation behavior of ultrathin gate oxide...
[[abstract]]In this work, the post-breakdown behavior of ultra-thin (3.4 and 5 nm) SiO2 films under ...
Un nouveau model qui relatione les phénomènes de dégradation et de rupture de couches minces de SiO2...
Ramped-current and ramped-voltage current-voltage (I-V) measurements were carried out to investigate...
Switching between well defined states of post-breakdown conduction in ultra-thin SiO 2 films is obse...
[[abstract]]This paper investigated the degradation and breakdown characteristics of an ultrathin si...
The experimentally determined conduction mechanisms of gate leakage current are examined for two dif...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
This paper proposes a poststress time evolution model for sub-10-nm thick SiO2 films for degradation...
Despite extensive experimental and theoretical studies, the atomistic mechanisms responsible for die...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
When an ultrathin (<5 nm) oxide is subjected to electrical stress, several soft-breakdown events can...
The defect band structure and properties of postbreakdown SiO(2) have been investigated by the varia...
The breakdown dynamics of ultrathin SiO2 films in metal-oxide-semiconductor structures has been inve...
We present an analytic model for the soft breakdown failure mode in ultrathin SiO2 films based on th...
The physical origin of post soft breakdown (SBD) current saturation behavior of ultrathin gate oxide...
[[abstract]]In this work, the post-breakdown behavior of ultra-thin (3.4 and 5 nm) SiO2 films under ...
Un nouveau model qui relatione les phénomènes de dégradation et de rupture de couches minces de SiO2...
Ramped-current and ramped-voltage current-voltage (I-V) measurements were carried out to investigate...
Switching between well defined states of post-breakdown conduction in ultra-thin SiO 2 films is obse...
[[abstract]]This paper investigated the degradation and breakdown characteristics of an ultrathin si...
The experimentally determined conduction mechanisms of gate leakage current are examined for two dif...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
This paper proposes a poststress time evolution model for sub-10-nm thick SiO2 films for degradation...
Despite extensive experimental and theoretical studies, the atomistic mechanisms responsible for die...
Defect current of ultrathin oxides after degradation and breakdown was investigated by defect band s...
When an ultrathin (<5 nm) oxide is subjected to electrical stress, several soft-breakdown events can...
The defect band structure and properties of postbreakdown SiO(2) have been investigated by the varia...
The breakdown dynamics of ultrathin SiO2 films in metal-oxide-semiconductor structures has been inve...
We present an analytic model for the soft breakdown failure mode in ultrathin SiO2 films based on th...
The physical origin of post soft breakdown (SBD) current saturation behavior of ultrathin gate oxide...
[[abstract]]In this work, the post-breakdown behavior of ultra-thin (3.4 and 5 nm) SiO2 films under ...
Un nouveau model qui relatione les phénomènes de dégradation et de rupture de couches minces de SiO2...