A switching from a high-conduction state to a low-conduction state occurs in an AIN thin film containing Al nanocrystals (nc-AI) when the nc-AI is charged with electrons. The switching is explained in terms of breaking of the conductive percolation paths of the nc-AI as a result of the charging of the nc-AI. A write-once-read many times-memory (WORM) device is demonstrated based on this phenomenon. The device can be switched by charging the nc-AI with a voltage of +10 V for 100 ms, yielding a current ratio of the two memory states of more than 300 at the reading voltage of 1 V. The charged state (i.e., the low-conduction state) remains unchanged after more than 1 x 106 read cycles, and its retention time is predicted to be more than 10 year...
High-resolution transmission electron microscopy images showed that ZnO nanoparticles were randomly ...
A write-once-read-many-times (WORM) memory device based on conduction switching of a NiO thin film i...
The possibility of fabricating electronic devices with functional building blocks of atomic size is ...
Reactive sputtering has been used to synthesize Al-rich Al2O3 thin films. After post-deposition ther...
Current-voltage (I-V) curves at 300 K for Al/InP-ZnS nanoparticles embedded in a polymethyl methacry...
Al-rich AlN thin film, which is deposited onto n -type Si substrate by radio frequency sputtering of...
A facile and low-cost process was developed for fabricating write-once-read-many-times (WORM) Cu/Ag ...
Nanometallic resistance switching devices based on amorphous insulator-metal thin films are develope...
The influence of the top contact electrode on the switching characteristics of a low operating volta...
Nanometallic resistance switching devices based on amorphous insulator-metal thin films are develope...
An Al-rich aluminum nitride (AlN) thin film is deposited on a p-type silicon substrate by radio freq...
A write-once-read-many-times (WORM) memory device based on conduction switching of a NiO thin film i...
In this work, Al 2O 3 thin film containing Al nanocrystals (nc-Al) is deposited on Si substrate by r...
We demonstrated write-once-read-many-times (WORM) memory devices based on graphene oxide (GO) film s...
Egg albumen, as an important protein resource in nature, is an interesting dielectric material exhib...
High-resolution transmission electron microscopy images showed that ZnO nanoparticles were randomly ...
A write-once-read-many-times (WORM) memory device based on conduction switching of a NiO thin film i...
The possibility of fabricating electronic devices with functional building blocks of atomic size is ...
Reactive sputtering has been used to synthesize Al-rich Al2O3 thin films. After post-deposition ther...
Current-voltage (I-V) curves at 300 K for Al/InP-ZnS nanoparticles embedded in a polymethyl methacry...
Al-rich AlN thin film, which is deposited onto n -type Si substrate by radio frequency sputtering of...
A facile and low-cost process was developed for fabricating write-once-read-many-times (WORM) Cu/Ag ...
Nanometallic resistance switching devices based on amorphous insulator-metal thin films are develope...
The influence of the top contact electrode on the switching characteristics of a low operating volta...
Nanometallic resistance switching devices based on amorphous insulator-metal thin films are develope...
An Al-rich aluminum nitride (AlN) thin film is deposited on a p-type silicon substrate by radio freq...
A write-once-read-many-times (WORM) memory device based on conduction switching of a NiO thin film i...
In this work, Al 2O 3 thin film containing Al nanocrystals (nc-Al) is deposited on Si substrate by r...
We demonstrated write-once-read-many-times (WORM) memory devices based on graphene oxide (GO) film s...
Egg albumen, as an important protein resource in nature, is an interesting dielectric material exhib...
High-resolution transmission electron microscopy images showed that ZnO nanoparticles were randomly ...
A write-once-read-many-times (WORM) memory device based on conduction switching of a NiO thin film i...
The possibility of fabricating electronic devices with functional building blocks of atomic size is ...