Semiconductor processing temperatures are currently measured using either pyrometers or thermocouples, both of which have significant limitations. Temperature measurements based on the temperature dependance of the Lamb wave velocities in silicon and longitudinal waves through the ambient directly above the wafer are explored
Silicon MEMS resonators have great potential for on-chip high frequency signal applications. This pa...
A novel technique is presented for simultaneously measuring temperature and crystallinity in situ du...
Temperature is a crucial parameter in many planar technology processing steps. However, the determin...
Semiconductor processing temperatures are currently measured using either py-rometers or thermocoupl...
Semiconductor processing temperatures are currently measured using either pyrometers or thermocouple...
textLight-pipe radiation thermometers (LPRTs) are widely used to monitor temperature during thermal...
The measurement of process variables such as temperature, stress/strain, force, and pressure at diff...
A measurement method and measurement results for the temperature of miniature microbridge emitters i...
The use of the photoacoustic technique to monitor the thermal properties of materials that can be ob...
The non-contact measurement of temperature by using the emitted thermal radiation has been an innova...
It is shown that in situ HeNe laser ellipsometric measurements performed during and after rf plasma ...
The capabilities of the optoacoustic principle as a means of temperature measurement have been explo...
A noncontact laser system has been designed that employs a pulsed photoacoustic source and an interf...
Temperature is one of the most important quantities in semiconductor manufacturing. It plays an impo...
This paper introduces a novel on-chip measurement technique for the determination of the central fre...
Silicon MEMS resonators have great potential for on-chip high frequency signal applications. This pa...
A novel technique is presented for simultaneously measuring temperature and crystallinity in situ du...
Temperature is a crucial parameter in many planar technology processing steps. However, the determin...
Semiconductor processing temperatures are currently measured using either py-rometers or thermocoupl...
Semiconductor processing temperatures are currently measured using either pyrometers or thermocouple...
textLight-pipe radiation thermometers (LPRTs) are widely used to monitor temperature during thermal...
The measurement of process variables such as temperature, stress/strain, force, and pressure at diff...
A measurement method and measurement results for the temperature of miniature microbridge emitters i...
The use of the photoacoustic technique to monitor the thermal properties of materials that can be ob...
The non-contact measurement of temperature by using the emitted thermal radiation has been an innova...
It is shown that in situ HeNe laser ellipsometric measurements performed during and after rf plasma ...
The capabilities of the optoacoustic principle as a means of temperature measurement have been explo...
A noncontact laser system has been designed that employs a pulsed photoacoustic source and an interf...
Temperature is one of the most important quantities in semiconductor manufacturing. It plays an impo...
This paper introduces a novel on-chip measurement technique for the determination of the central fre...
Silicon MEMS resonators have great potential for on-chip high frequency signal applications. This pa...
A novel technique is presented for simultaneously measuring temperature and crystallinity in situ du...
Temperature is a crucial parameter in many planar technology processing steps. However, the determin...