We studied the mechanism of oxygen transfer from a quartz crucible to a multicrystalline silicon during unidirectional solidifiation process. We investigated the boundary layer thickness of oxygen concentration near a crucible wall region using FTIR measurement. The results suggest that oxygen concentration was increased near a crucible wall, and the boundary layer thickness of oxygen concentration was estimated from 3 to 5 mm. The estimated value of boundary layer thickness of oxygen concentrations is similar to with that estimated by theoretical and numerical calculation. These results suggest that the oxygen was dissolved from a crucible wall through the liner made of Si_3N_4 to the melt during growth process
The German research network "SolarWinS", aiming at elucidating the fundamental limitation of multicr...
The solar cell industry has grown considerably and experiences renewed public interest due to techno...
The effects of argon gas flow rate on the oxygen concentration in Czochralski (CZ) grown silicon cry...
The present status and special features of experimental analysis and numerical modelling of oxygen t...
An alternative method to determine oxygen concentration in industrial monocrystalline silicon has be...
Directional solidification by the Vertical Gradient Freeze method (VGF) and related technologies is ...
The distribution of oxygen in silicon melts kept in a 14" diameter silica crucible of a standard Czo...
The purpose of this work is to investigate the influence of the crucible and its coating on the dete...
This paper presents a new model related to the incorporation ofoxygen and carbon in silicon single c...
Impurity concentrations of oxygen, carbon, nitrogen, iron, and other heavy metals should be well con...
Thesis: S.M., Massachusetts Institute of Technology, Department of Mechanical Engineering, 2017.Cata...
The present paper focuses on modeling Cz and DS Si-crystal growth. There are a few related problems ...
This paper reports the relationship between oxygen concentration and dislocation multiplication in s...
Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering...
AbstractWe present a technique to measure the interstitial oxygen concentration in monocrystalline s...
The German research network "SolarWinS", aiming at elucidating the fundamental limitation of multicr...
The solar cell industry has grown considerably and experiences renewed public interest due to techno...
The effects of argon gas flow rate on the oxygen concentration in Czochralski (CZ) grown silicon cry...
The present status and special features of experimental analysis and numerical modelling of oxygen t...
An alternative method to determine oxygen concentration in industrial monocrystalline silicon has be...
Directional solidification by the Vertical Gradient Freeze method (VGF) and related technologies is ...
The distribution of oxygen in silicon melts kept in a 14" diameter silica crucible of a standard Czo...
The purpose of this work is to investigate the influence of the crucible and its coating on the dete...
This paper presents a new model related to the incorporation ofoxygen and carbon in silicon single c...
Impurity concentrations of oxygen, carbon, nitrogen, iron, and other heavy metals should be well con...
Thesis: S.M., Massachusetts Institute of Technology, Department of Mechanical Engineering, 2017.Cata...
The present paper focuses on modeling Cz and DS Si-crystal growth. There are a few related problems ...
This paper reports the relationship between oxygen concentration and dislocation multiplication in s...
Thesis: S.B., Massachusetts Institute of Technology, Department of Materials Science and Engineering...
AbstractWe present a technique to measure the interstitial oxygen concentration in monocrystalline s...
The German research network "SolarWinS", aiming at elucidating the fundamental limitation of multicr...
The solar cell industry has grown considerably and experiences renewed public interest due to techno...
The effects of argon gas flow rate on the oxygen concentration in Czochralski (CZ) grown silicon cry...